Used TEL / TOKYO ELECTRON TE 8500 #293643115 for sale

TEL / TOKYO ELECTRON TE 8500
ID: 293643115
Wafer Size: 8"
Vintage: 1991
Dry etcher, 8" 1991 vintage.
TEL / TOKYO ELECTRON TE 8500 is a state-of-the-art etcher specifically designed for use in the semiconductor industry. The equipment boasts an impressive array of features that make it ideal for managing the etching process in semiconductor fabrication. The system is composed of three main components: a processing chamber, a medium power source, and an exhaust unit. The processing chamber of TEL TE 8500 is equipped with a range of features, providing consistent and accurate etching results. It includes a temperature-controlled reaction chamber and a medium power source for precisely controlling ion intensity. Its precise control over gas distribution within the chamber ensures high uniformity of etching, regardless of the part size or shape. The medium power source used within TOKYO ELECTRON TE 8500 provides precise control of the etching process, resulting in etched parts with maximum accuracy and minimum deviation. It is equipped with an ultra-high frequency generator, an RF antenna machine, and an RF plasma exciter. These components ensure that the etchant gas and the chamber are kept at a precise temperature and etching rate. TE 8500 also features an exhaust tool which is designed to efficiently remove all hazardous process-generated particles and waste. This asset eliminates particulates and other contaminants, ensuring that only clean, residue-free parts are produced. The exhaust model also helps reduce the amount of materials used during the etching process, resulting in cost savings and environmental benefits. Finally, TEL / TOKYO ELECTRON TE 8500 equipment is designed to be user-friendly, providing easy-to-use software and an intuitive user interface. The system is capable of performing multiple etching operations from the same platform, thus improving process efficiency and reducing the need for unnecessary production steps. The unit also offers a range of options for programming and monitoring the etching process, enabling users to customize the etching process to suit their specific requirements.
There are no reviews yet