Used TEL / TOKYO ELECTRON TE 8500 #293758440 for sale

TEL / TOKYO ELECTRON TE 8500 is an advanced etcher/asher system designed to provide precise and accurate processes of film processing in the electronics and semiconductor fields. This etcher can be used to deposit thin-film layers on a variety of substrates including silicon, gallium arsenide, glass, and sapphire. This etcher/ asher uses ultra-high vacuum technology to ensure that the etching process is clean and free of contaminants. TEL TE 8500 features a large chamber diameter of 500 mm and a maximum substrate size of 18"x18". It has an average temperature stability of ± 0.2°C, and an operating temperature range of 10°C to 600°C. A unique feature of this etcher is its ability to process multiple layers at different RF powers, making it ideal for advanced semiconductor devices that require multiple layers of thin-film deposition. TOKYO ELECTRON TE 8500 is designed for safe operation and is equipped with advanced safety features, such as auto-shutdown upon detection of any irregularities, and dual gas line safety valves that prevent overpressure in the chamber. Additionally, the etcher is equipped with an integrated temperature-control system and a static anti-backlash motion stage that ensures accuracy and repeatability during the etching process. This etcher/asher has a versatile range of capabilities that can be tailored to the needs of any application, ranging from ultra-thin layers to thick-film processes. programs can operate in either step-by-step or continuous mode, and the etcher also features a quick-change feature that allows for rapid material changes. TE 8500 can process a wide variety of substrate materials and uses a variety of gases such as oxygen, nitrogen, argon, hydrogen, fluorine and chlorine, giving it a wide range of etching capabilities. TEL / TOKYO ELECTRON TE 8500 is an excellent etcher/asher for use in the electronics and semiconductor fields. Its large chamber size and temperature stability coupled with its versatility make it suitable for a wide range of applications, from ultra-thin layers to thick-film processing. Its advanced safety features and integrated temperature-control system make it a reliable and effective etcher/asher for the most demanding processes.