Used TEL / TOKYO ELECTRON TE 8500 #9402436 for sale

ID: 9402436
Wafer Size: 8"
Dry etchers, 8" Chamber: EB.
TEL / TOKYO ELECTRON TE 8500 is a high-performance etcher/asher designed for semiconductor device production. This tool delivers highly precise results at high speeds and low costs. TEL TE 8500 integrates multiple process flows with fine or pure etching capabilities and enables high-precision etching of small patterns down to 0.25 μm. TOKYO ELECTRON TE 8500 also has powerful thin-film deposition capabilities, allowing for thin-film deposition processes with a low-pressure plasma generated from either hydrogen (H2) or fluorine (F2). The system also contains an advanced user-friendly graphical control interface that allows easy program setup and efficient recipe control. The machine can be integrated with other manufacturing equipment to ensure that data is exchanged and process flows are optimized. TE 8500 is equipped with two process chambers, two loadlocks, a gas supply box, and a plasma source. The appropriate approach is used to generate a high-density plasma. TEL / TOKYO ELECTRON TE 8500 has a special design to optimize the process performance, with lower consumption of etchant material, as well as reduce the environmental impact of the etching process. The temperature in the processing chamber is passively stabilized, and an innovative anodization control system (ACS) maintains the purity of the environment. The ACS also prevents the anodizing reaction from being affected by changing ambient conditions. TEL TE 8500 is equipped with a variety of sensors to monitor in-situ process parameters such as plasma power, temperature, and degree of chamber cleanliness. The monitors allow the operator to make timely adjustments to ensure optimum results. Additionally, its advanced control system enables easy recipe setup and ensures efficient control of the etching process. TOKYO ELECTRON TE 8500 is an excellent choice for those in need of an efficient etching solution. Its precision, speed, low cost, and efficient process control make it an ideal choice for semiconductor device manufacturing.
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