Used TEL / TOKYO ELECTRON TE 8500P #9412456 for sale

TEL / TOKYO ELECTRON TE 8500P
ID: 9412456
Wafer Size: 8"
Dry etcher, 8".
TEL / TOKYO ELECTRON TE 8500P is an advanced etcher for use in semiconductor and other industrial applications. It is designed to deliver high precision, reliability, and process repeatability. TEL TE 8500 P is based on a vacuum etching equipment with a flat panel load lock and a load station. It is equipped with a 450mm chamber with a 2.5" and 4" processing area and a single, dual, or four-bay design. It features an Automated Frequency Control™ and Oxide Assist™ chamber cleaning technologies to ensure consistently high throughput and processing uniformity. TOKYO ELECTRON TE-8500 P utilizes high-precision photoelectron optical systems for improved positional accuracy. It can also be automated using two-position on/off settings for each stage to optimize chamber performance and process control. In addition, pressure-controlled processes provide fast and repeatable etching and deposition steps. TOKYO ELECTRON TE 8500 P is delivered with TEL proprietary APT OPC. The APT OPC is a model-based optical proximity correction, which allows for optimal lithography and etching results. It is also able to operate in 45nm or below resolution and is compatible with a variety of recipes. The etcher features an ergonomic control system with an intuitive graphical user interface and automated operating parameters that can be stored as recipes in the database. TE-8500 P can be further customized to meet production requirements with reusable sequences, a file streaming feature, plug-in modules, and enhanced OPC functions. TEL TE-8500 P includes several safety features, including the over-pressure safety interlock that ensures process operations between acceptable pressures with a three-level passcode access unit. It also features a dynamic temperature control machine and chemical management that prevents contamination of the etching tool. In conclusion, TOKYO ELECTRON TE 8500P Etcher is an ideal choice for advanced semiconductor etching applications. It combines high precision, reliability, and process repeatability with specialized etching technologies, intuitive control systems, and various safety features for an optimized etching process.
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