Used TEL / TOKYO ELECTRON TE 8500PE #293635445 for sale

TEL / TOKYO ELECTRON TE 8500PE etcher / asher is a state of the art etching device that utilizes a direct current (DC)-plane magnetron plasma process in combination with physical vapor deposition (PVD). This highly advanced etcher / asher is used for plasma etching and thin film deposition. The device is equipped with many technological features and offers several advantages over traditional etching/deposition techniques. TEL TE 8500PE has a unique dual source design and offers great flexibility in etching / deposition processes. It provides the option to use various gases such as helium, chlorine, argon, oxygen and hydrogen, allowing for great versatility in etching and deposition processes. The powerful magnetron in the device produces an intense and uniform plasma field, ensuring ideal etching / deposition process results. Moreover, the DC power supply enables greater control over etching and deposition rates, allowing for a high-quality etching / deposition process. With a very high deposition rate, TOKYO ELECTRON TE 8500 PE is able to achieve a high degree of coverage. This advanced etcher/asher has a large, enclosed chamber, with a complex design that provides reliable temperature and pressure control, preventing quality issues with the etching/deposition process. Furthermore, the device is equipped with technologies such as suction bumpers, optical emission spectroscopy and quartz crystal monitoring, enabling quality control. TE 8500 PE also employs advanced safety and environmental protection technologies, which include automatic leak detection, carbon filter systems and a vacuum evacuation system, making it an excellent choice for high-volume production. Additionally, the device is designed with an automated maintenance system, allowing the unit to be easily serviced and externally updated. In summary, TE 8500PE etcher / asher is a sophisticated etching/deposition device, offering a versatile and reliable process for etching and deposition. Its advanced features make it a perfect solution for high-volume, uniform etching and deposition. Additionally, the powerful magnetron, large enclosed chamber and sophisticated safety and maintenance features make it an ideal device for any etching/deposition facility.