Used TEL / TOKYO ELECTRON TE 8500S #9194477 for sale

TEL / TOKYO ELECTRON TE 8500S
ID: 9194477
Vintage: 1996
Oxide etcher Wafer type: Notch Chuck type 1: Polymide Chuck type 2: M-Type Caassette: 6" Cassette Monitor type: LCD Signal tower: PATLITE SLF-V Visual: R / Y / G / B Wafer transfer module: Transfer robot: Load lock 1,2,3 / 6" or 8" Transfer robot motor: R-Motor, E-motor (L/L 1,2,3) Transfer robot driver: R-Driver, E-driver (L/L 1,2,3) Process module 1: APC Valve: TYLAN MDV-108 APC Heater & heater controller: Heater type Matcher: DAIHEN MFM-20SA Power splitter: DAIHEN MFT-20SB C/M (Baratron): 10 Torr vaccum general CMLA-11 B.P He Control (Edge): C/M (Baratron): TYLAN CMLA-21 100 TORR PCV Unit / He controller: AERA PV-104C MFC: SEC-4400RC TMP: SEIKO SEIKI STP-H600C1 GAP Gas module: P/C1 MFC / Gas1 (name/range/maker/model): CHF3 / 200 SCCM / STEC / SEC-7440MC MFC / Gas2 (name/range/maker/model): CF4 / 200 SCCM / STEC / SEC-7440MC MFC / Gas3 (name/range/maker/model): AR / 2 SLM / STEC / SEC-7440MC MFC / Gas4 (name/range/maker/model): HE / 1 SLM / STEC / SEC-7440MC MFC / Gas5 (name/range/maker/model): N2 / 100 SCCM / STEC / SEC-7440 Generator: DAIHEN MFG-20SA P/C Power Chiller: LASEM TECH BCU-L152 Chiller Chiller type: Dual Pump: P/C Pump: EDWARDS IQDP80 L/L Pump: EDWARDS IQDP80 EPD: JOBIN YVON H-10VIS 1996 vintage.
TEL / TOKYO ELECTRON TE 8500S is an etcher, or asher, used to precisely pattern photomasks and substrates for microelectronics fabrication. It is capable of directional etching, evacuation and determination of endpoint with high accuracy, as well as offering a high-resolution pattern transfer from the photomask onto the substrate. TEL TE 8500(S) is equipped with automated recipe setting to ensure consistent etch processes each time. It has a wide temperature range of substrate/mask heating and cooling, enabling it to be used with various materials from silicon to metals, while the cryogenic dry etcher process eliminates need of supplying expensive extra gas or byproducts. Additionally, it is capable of performing anisotropic etching, as well as providing a pulse etch. This allows for surface smoothing in the case of electroplating gold, as well as small via etching. This etcher also utilizes state-of-the-art thermo-ionic emitter technology to provide control over the plasma and enable high selectivity in the etch pattern transfer. Lastly, TOKYO ELECTRON TE 8500 (S) offers a micro-pseudo process to reduce contamination of deposited and etch area. This translates to an increased service life of the asher, and can decrease the need for maintenance and repairs. All this combines to make TEL / TOKYO ELECTRON TE 8500(S) an excellent etcher, or asher, for high-precision applications in the microelectronics manufacturing industry.
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