Used TEL / TOKYO ELECTRON TE 8500S #9194477 for sale
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ID: 9194477
Vintage: 1996
Oxide etcher
Wafer type: Notch
Chuck type 1: Polymide
Chuck type 2: M-Type
Caassette: 6" Cassette
Monitor type: LCD
Signal tower: PATLITE SLF-V
Visual: R / Y / G / B
Wafer transfer module:
Transfer robot: Load lock 1,2,3 / 6" or 8"
Transfer robot motor: R-Motor, E-motor (L/L 1,2,3)
Transfer robot driver: R-Driver, E-driver (L/L 1,2,3)
Process module 1:
APC Valve: TYLAN MDV-108
APC Heater & heater controller: Heater type
Matcher: DAIHEN MFM-20SA
Power splitter: DAIHEN MFT-20SB
C/M (Baratron): 10 Torr vaccum general CMLA-11
B.P He Control (Edge):
C/M (Baratron): TYLAN CMLA-21 100 TORR
PCV Unit / He controller: AERA PV-104C
MFC: SEC-4400RC
TMP: SEIKO SEIKI STP-H600C1
GAP
Gas module: P/C1
MFC / Gas1 (name/range/maker/model): CHF3 / 200 SCCM / STEC / SEC-7440MC
MFC / Gas2 (name/range/maker/model): CF4 / 200 SCCM / STEC / SEC-7440MC
MFC / Gas3 (name/range/maker/model): AR / 2 SLM / STEC / SEC-7440MC
MFC / Gas4 (name/range/maker/model): HE / 1 SLM / STEC / SEC-7440MC
MFC / Gas5 (name/range/maker/model): N2 / 100 SCCM / STEC / SEC-7440
Generator:
DAIHEN MFG-20SA P/C Power
Chiller:
LASEM TECH BCU-L152 Chiller
Chiller type: Dual
Pump:
P/C Pump: EDWARDS IQDP80
L/L Pump: EDWARDS IQDP80
EPD: JOBIN YVON H-10VIS
1996 vintage.
TEL / TOKYO ELECTRON TE 8500S is an etcher, or asher, used to precisely pattern photomasks and substrates for microelectronics fabrication. It is capable of directional etching, evacuation and determination of endpoint with high accuracy, as well as offering a high-resolution pattern transfer from the photomask onto the substrate. TEL TE 8500(S) is equipped with automated recipe setting to ensure consistent etch processes each time. It has a wide temperature range of substrate/mask heating and cooling, enabling it to be used with various materials from silicon to metals, while the cryogenic dry etcher process eliminates need of supplying expensive extra gas or byproducts. Additionally, it is capable of performing anisotropic etching, as well as providing a pulse etch. This allows for surface smoothing in the case of electroplating gold, as well as small via etching. This etcher also utilizes state-of-the-art thermo-ionic emitter technology to provide control over the plasma and enable high selectivity in the etch pattern transfer. Lastly, TOKYO ELECTRON TE 8500 (S) offers a micro-pseudo process to reduce contamination of deposited and etch area. This translates to an increased service life of the asher, and can decrease the need for maintenance and repairs. All this combines to make TEL / TOKYO ELECTRON TE 8500(S) an excellent etcher, or asher, for high-precision applications in the microelectronics manufacturing industry.
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