Used TEL / TOKYO ELECTRON TELFORMULA #293825241 for sale
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TEL / TOKYO ELECTRON TELFORMULA is an advanced etching and ashing process used in the semiconductor industry. This high-end etcher/asher is used for high aspect ratio etching and de-scumming of advanced semiconductor devices. With the increased miniaturization of today's electronics, the demand for clean, uniform etching and ashing of small devices is high. TEL TELFORMULA is a PC-controlled system designed to precisely etch small components in all directions. The etcher/asher's advanced technology allows it to simultaneously etch in the x, y, and z directions, providing a uniform etch surface on all the components. TOKYO ELECTRON TELFORMULA is also equipped with advanced computer-assisted image analysis software. This software allows the user to digitally inspect the etched components, as well as select parameters such as etch time, etch angle, and etch rate. This allows for a uniform etch with maximum yield and minimal waste. TELFORMULA is designed to be easy to use and properly maintain. It has a self-diagnosis feature, which alerts the user to any potential problems before they can become serious issues. TEL / TOKYO ELECTRON TELFORMULA also features a real-time monitoring system, which allows the user to easily see the progress of an etch job. This lets the user know how long the etch will take and also allows them to make any necessary adjustments as needed. TEL TELFORMULA utilizes an advanced etch chemistry. It combines the etching of the silica layer of the semifinished silicon with the formation of a conductor oxide layer. This combination ensures that etch uniformity is achieved without affecting the functionality of the device. Also, TOKYO ELECTRON TELFORMULA can be configured to for both wet and dry etching. In summary, TELFORMULA is an advanced etching and ashing process designed to provide precise etching of all directions of small components. It features computer-aided image analysis software, self-diagnosis, and real-time monitoring. It utilizes advanced etch chemistry to ensure uniformity and is configurable for both wet and dry etching.
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