Used TEL / TOKYO ELECTRON TELINDY IRAD ALD Oxide #9294226 for sale

TEL / TOKYO ELECTRON TELINDY IRAD ALD Oxide
ID: 9294226
Wafer Size: 12"
Vertical LPCVD furnace, 12".
TEL / TOKYO ELECTRON TELINDY IRAD ALD Oxide is an advanced dry etching platform suitable for advanced ICs device fabrication. It combines traditional etching and advanced oxidation technologies to provide precise etching solutions for the fabrication of complex structures on a wide range of materials. The etcher/asher is comprised of two adjacent working chambers, both under vacuum: the lower chamber is the etching chamber and the upper one is the oxidation chamber. The etching chamber contains two independent magnetrons which are used for the delivery of the etching gas and the generation of high-density plasma. This chamber can be used to etch materials such as metals, organic materials, and dielectrics due to its ultra-high densities. The etching rate is accurate and repeatable from sample to sample. The oxidation chamber utilizes atomic layer deposition (ALD) to create a layer of oxide on any selected area. The deposition materials can be tailored to be suitable for the level of protection needed as well as for the specific substrate. The ALD tophat feature also ensures uniformity of the etched area. TEL TELINDY IRAD ALD Oxide etcher/asher also features numerous processes such as wafer orientation, substrate heating and cooling, etch profile measurement, and process repeatability. Its software interface has integrated recipe management feature which ensure safety and compatibility with each process. It is a reliable and robust tool with amazing precision control of all necessary parameters. The ALD oxidation and etching technology used in TOKYO ELECTRON TELINDY IRAD ALD Oxide etcher/asher makes it the perfect tool for high-precision etching and deposition. It is extremely user-friendly and provides advanced levelling technology to ensure repeatable and accurate etching and deposition. It can be used for a variety of substrates such as metals, organic materials, and dielectrics, and its advanced feature sets makes it a great tool for device fabrication.
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