Used TEL / TOKYO ELECTRON TELINDY Oxide #9196076 for sale

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ID: 9196076
Wafer Size: 12"
Vintage: 2008
Vertical LPCVD furnace, 12" Model: TEL INDY-A-L Process: HTOX System power rating: 480 V, 3 Phase / 120 V, 1 Phase Loading configuration: 4 (Dual boat) Furnace module I/O Module Exhaust box Gas box Power box Currently installed 2008 vintage.
TEL / TOKYO ELECTRON TELINDY Oxide is an etcher / asher used for etching or ashing metal oxide layers from the surfaces of materials like semiconductor substrates and wafers. It is composed of two chambers: the main processing chamber and the reaction chamber. The main processing chamber is equipped with an electron cyclotron resonance (ECR) plasma source. This source is responsible for generating ECR-driven plasma which is then used to perform the etching and ashing processes. The reaction chamber has a modified version of inductively coupled plasma (ICP) source used in conjunction with the ECR source. This dual-source configuration enables a highly precise and efficient dry etching process. The ECR and ICP sources generate an RF plasma of ions and radicals, formed from a mixture of oxygen, argon, and other gases that are introduced into the processing chamber. This plasma is then used to etch or ashed the layers of metal oxide from the surface of substrates like semiconductor wafers. Once the oxide layer is eliminated, the quality of the layer and the quality of the end product is improved. The depth and the rate of the etching/ashing is adjustable and can be fine-tuned by changing the pressure, power, and gas mixture within the processing chamber. TEL TELINDY Oxide is an efficient and reliable etcher / asher, capable of processing a wide variety of materials at the Nano and micro levels. It is suitable for metals, ceramics, and semiconductor materials alike. It offers low defect density in the substrates, high throughput, and superior surface quality. It can be used to thin or manipulate wafers with thicknesses between 50 and 500 µm, and is especially useful for the fabrication of 3D stacked memory devices. TOKYO ELECTRON TELINDY Oxide has a variety of safety features for operator and process protection. These include a break-through point protection, which monitors the operation status, a keyboard and alarm system, an overpressure protection and a color thermal imaging camera for monitoring the temperature of the processing chamber. In short, TELINDY Oxide is an efficient, reliable, and versatile etcher / asher that is capable of handling a wide variety of materials at the Nano and micro-levels. It offers safety, precision, and efficiency and is compatible with numerous process recipes and materials.
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