Used TEL / TOKYO ELECTRON TELINDY Oxide #9233213 for sale

TEL / TOKYO ELECTRON TELINDY Oxide
ID: 9233213
Wafer Size: 12"
Vertical LPCVD furnace, 12".
TEL (TOKYO ELECTRON) TEL / TOKYO ELECTRON TELINDY Oxide is an etcher/asher equipment developed by TEL / TOKYO ELECTRON for the production of high-quality thin film depositions and complex multilayered structures. The system utilizes chemical vapor deposition and plasma-enhanced chemical vapor deposition (PECVD) technologies to deposit materials onto silicon wafers. This makes it suitable for the fabrication of cutting-edge semiconductor devices and instruments used in miniaturization and precision device engineering. TEL TELINDY Oxide is capable of dry etching with precision control of process parameters like flow rates and gases. These parameters determine the profile of the etching process and the resulting film thickness. The unit is equipped with a 4 inch reaction chamber, allowing for the deposition of larger areas of silicon wafer components. Additionally, the machine is capable of 2 stage etching with high precision. The first stage is the base etching process, which is used to create the basic structure and shape of the components while the second is the top etching process to refine the details. An etch using TOKYO ELECTRON TELINDY Oxide is highly accurate, whether used with a single or multi-layer etch process. This makes it an ideal choice for the production of intricately patterned substrates required for use in devices such as LCDs, CCDs, and MEMS. In terms of safety, TELINDY Oxide tool features an emergency power off (EPO) switch and an emergency vent asset. The EPO switch will immediately shut off the model in case of emergency while the vent equipment will evacuate the air and gases inside. The system also features a pressurized reaction chamber, which reduces the possibility of leaks or contamination while ensuring a stable reaction environment. Lastly, TEL / TOKYO ELECTRON TELINDY Oxide unit is equipped with a user-friendly control panel. This allows users to save settings and programs, improve etch rate, and replicate etching results for fast product development. Additionally, the machine features a touchscreen LCD monitor as well as data trackers for monitoring injection, gas flow rates, and pressure autonomy. Overall, TEL TELINDY Oxide tool is an advanced etcher/asher asset capable of performing precise, high-quality etches with complex multilayered structures. Its sensors and monitoring systems guarantee users will not experience any problems like gas leaks or contamination. Furthermore, its user-friendly control panel ensures that process parameters are easily tracked and edited.
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