Used TEL / TOKYO ELECTRON TELINDY Plus ALD High-K #9128140 for sale

TEL / TOKYO ELECTRON TELINDY Plus ALD High-K is an etcher/asher designed for advanced etching and ashing processes. It is designed for materials such as low-K oxides, high-K dielectric stacks, and line/space patterning. It is a complete equipment that combines both etching and ashing with advanced process control to achieve quicker and more precise processing. TEL TELINDY Plus ALD High-K system has a unique Parabolic Micro Furnace Unit which is capable of an extremely wide range of process temperatures that is optimized at high temperatures to provide high etching and ashing rates. The machine is also equipped with advanced process control to ensure better device tolerance and repeatability. It has multiple Automatic Process Sequencers (APS) that can be used to quickly program required processes and extend the versatility and flexibility of the tool. It also has two independent, high-sensitivity quartz crystal mass monitors and Oxidizing-Reducing (OR) etch control to ensure high process repeatability and uniformity. The asset also features advanced Contamination Control Mechanism (CCM) to maintain the highest levels of wafer cleanliness. The CME Process is a unique set of proprietary technologies to prevent rapid-recovery and maintain a high level of plasma cleanliness during the process. It also has a patented open tube design and gas shower to minimize contamination and chemicals, while enhancing process performance. The model additionally features a highly integrated vacuum equipment that comprises the high-performance main pump, the secondary pump, the turbo molecular pump, and the vacuum switching valves that are all designed for high-performance operation and minimal contamination. It also has an automated in-situ particle measuring system that can monitor, measure and log particle size at various locations in the process area. TOKYO ELECTRON TELINDY Plus ALD High-K unit is designed to provide reliable, repeatable etching and ashing for advanced device fabrication. It is suitable for two inch and larger larger diameters with etching/ashing speeds up to high speeds, as well as for low-K oxide, high-K dielectric stack and line-space patterning with wafer-level high process repeatability and device tolerance. With its unique range of features, it is an ideal etcher/asher for many advanced device fabrication applications.