Used TEL / TOKYO ELECTRON TELINDY Plus ALD #293818328 for sale

TEL / TOKYO ELECTRON TELINDY Plus ALD (Atomic Layer Deposition) is a type of precision asher typically used to synthesize thin films of metals, oxides, nitrides and other materials. This etcher is primarily used in nanotechnology and microelectronic applications, where its ability to create high-quality, nanometer-thick coatings are often highly advantageous. TEL TELINDY Plus ALD works by a process of sequential gas-phase chemical reaction on a substrate surface, leading to greatly increased control over film thickness and uniformity. This process enables the creation of complex 3-dimensional structures, tailored for specific applications. A typical system setup consists of two source modules, a delivery chamber and a substrate holder. The source modules in TOKYO ELECTRON TELINDY Plus ALD system contain an inlet, a reaction chamber, flow control valves, and temperature/pressure sensors. Each module holds up to 32 chemicals and can be operated independently for simultaneous multi-process applications. The delivery chamber is used to control the reactant gases and move them to the substrate. This chamber is equipped with a mass flow controller, a vacuum gauge, and a series of gas baffles, which help ensure that the process gases reach the substrate with the correct pressure and uniformity. The substrate holder allows precise control of the substrate's temperature, and is movable in the Z plane, enabling the coating of samples on both sides. The sample holder is generally heated by embedded heaters, with thermal insulation to minimize temperature loss. By controlling the simultaneous delivery of the precursor compounds, TELINDY Plus ALD can coat a sample with an extremely uniform, monolayer-thick film. The process is completed when these precursor molecules react with each other on the surface, leading to the production of an extremely thin, highly uniform coating. TEL / TOKYO ELECTRON TELINDY Plus ALD etcher is a precise and reliable tool that allows users to coat a variety of substrates with precise, nanometer-thick films. With its precise control of the process variables and its high uniformity of the coating, this etcher provides precise results. This device is best suited for nanofabrication applications that require precise and uniform layers.