Used TEL / TOKYO ELECTRON Telius SP 308QS #9267846 for sale

TEL / TOKYO ELECTRON Telius SP 308QS
ID: 9267846
Wafer Size: 12"
Deep trench silicon etcher, 12" (5) Load ports Outgas station FACE 1 (Controller) FACE 2 (Controller) (4) Chambers (4) Gas boxes QUARTZ (2) AC Power (4) Pumps Pump stand Parts: (4) Buffer chamber pumps (4) Chillers Door Chiller stand.
TEL / TOKYO ELECTRON Telius SP 308QS etcher/asher is designed and manufactured by TEL (TOKYO ELECTRON) for auto-lab use in optimized semiconductor fabrication and device manufacturing. This powerful and advanced etcher/asher offers capabilities beyond the traditional dry etching process with its improved accuracy, control, and efficiency. TEL Telius SP 308QS is a batch tool with an 8-inch single wafer capability using an ECR (look-up table conformal etching in addition to the ISO-Dry etching process) chamber. It is equipped with a RF generator, mass flow controller, and a equipment controller. The etcher chamber has a clamping system to tightly secure a process wafer in place while etching. This chamber is capable of providing an optimal atmosphere with uniform flow distribution for uniform plasma generation, improved conformal etching, and improved cryogenic etching with improved repeatability. The SP 308QS offers productive etching processes for both ion and non-ion etching. The ECR chamber is ideal for wafer-thickness monitoring, using an RF generator to monitor the etching process to ensure uniform etching. It also supports electrochemical etching, chemical vapor etching, and reactive ion etching (RIE). The SP 308QS is designed to maximize uniformity, repeatability, and accuracy in each process step. As such, it is capable of operating in low-pressure and low-power mode to provide greater accuracy. The superior control capabilities of the SP 308QS offer repeatable uniform wafer etching. The unit also has a high-alignment accuracy option, which improves the accuracy of the metal and poly-silicon etching in small spaces. Other features of the SP 308QS include reduced maintenance time, precise parameter settings, and a user-friendly interface. In addition, the machine is highly compatible with popular process integration software such as Cimquest's Servel II and other Cimquest-related process management software systems. The SP 308QS also has full tool automation capability and boasts an innovative touch-screen panel user interface. Overall, TOKYO ELECTRON Telius SP 308QS etcher/aser offers optimized performance for batch semiconductor processing, allowing small-scale wafer production. With its superior control features, advanced ECR technologies, and efficient operations, the SP 308QS etcher/asher is the perfect choice for a range of research and development projects across auto-lab applications.
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