Used TEL / TOKYO ELECTRON Telius SP #293637535 for sale

TEL / TOKYO ELECTRON Telius SP
ID: 293637535
Wafer Size: 12"
Dry etchers, 12" 2001-2004 vintage.
TEL / TOKYO ELECTRON Telius SP is an innovative plasma etcher designed for industrial thin-film applications. It is a plasma-based equipment, utilizing a high-performance RF generator and magnetron to generate and boost a radio-frequency plasma efficiently. The etcher is also equipped with an integrated machine learning system that allows it to alter parameters as needed to maintain optimal etch results with minimal human intervention. TEL Telius SP features an advanced cyclic etch process that enables it to etch materials at a much faster rate than other etching systems. The etching chamber is capable of operating at up to four atmospheres pressure, which helps to increase the clustering efficiency of the process. It also utilizes an auto-leveling mechanism to evenly spread the arcing potential across the sample surface and to reduce the evaporation rate of etching gases. Its robust design allows it to operate at temperatures ranging from -5 to 75°C. In addition to its exceptional etching capabilities, TOKYO ELECTRON Telius SP also boasts a high-performance optical imaging unit for performing analysis on thin films after etching. This imaging machine is equipped with several components, including a high-performance CCD camera, an optical microscope, and an imaging computer. Using these components, the tool can perform detailed analysis of thin-film samples, providing users with data on the etch rate, surface profile, and thickness of samples. The user-friendly interface and intuitive software supplied with Telius SP make it easy for users to set up and operate the etching asset without requiring advanced technical knowledge. The setup process is quick, and the model can be calibrated with a few simple steps. The integrated machine learning equipment also makes the system fully automated, eliminating the need for complex parameter settings. Overall, TEL / TOKYO ELECTRON Telius SP exemplifies the latest advancements in plasma etching technology. Its advanced cyclic etch process enables it to etch materials at a much faster rate than other systems, while its high-performance imaging unit allows users to perform detailed analysis of thin-film samples. With its robust design and automated setup and operation, TEL Telius SP is an excellent choice for industrial applications looking for an advanced plasma etcher.
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