Used TEL / TOKYO ELECTRON Telius SP #9197603 for sale
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ID: 9197603
Wafer Size: 8"
Vintage: 2005
Oxide etcher, 8"
(3) Telius SP vesta chambers
2005 vintage.
TEL / TOKYO ELECTRON Telius SP is an etcher/asher designed for semiconductor packaging analysis and fabrication. It offers three types of etching capabilities: chemical etching, wet etching, and dry etching. Chemical etching can be used to create a high-quality surface finish by removing contaminants from the substrate. Wet etching is used to destroy the surface of the material so that it can be oxidized or etched away. Lastly, dry etching is used to create deep trenches and patterns in the substrate, which can be used for electrical pathways or feature definition. TEL Telius SP has a built-in high-pressure plasma (HPP) generator that can be used to create an efficient and consistent etching process. The unique tri-gas control system allows for the delivery of precise amounts of plasma gas and etching gas in a single process. This allows for a greater control of the etching parameters. TOKYO ELECTRON Telius SP also features a pyrolytic-based resist strip system, which helps to reduce total processing time. Telius SP also offers several control capabilities to provide users with the best etching results possible. It includes high-precision temperature control technology and closed-loop pressure control to maintain in-process stability. It also features an automatic chamber cleaning feature that helps to reduce material build up and contamination. TEL / TOKYO ELECTRON Telius SP can produce a variety of etching patterns, from simple through holes to complex device structures. With its easy to use user interface, users can accurately select etch strategies, generate oxide layers with high uniformity, and optimize the etching process. In addition, TEL Telius SP has a variety of safety features, such as a safety chamber enclosure and remote gas shutoff valves. TOKYO ELECTRON Telius SP etcher/asher is a versatile and reliable tool for semiconductor packaging and analysis applications. Its various etching capabilities and advanced control features make it a valuable tool for the modern fabrication process.
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