Used TEL / TOKYO ELECTRON Trias Ex-II #9311194 for sale

TEL / TOKYO ELECTRON Trias Ex-II
ID: 9311194
Vintage: 2014
System, 12" Process: Metal 2014 vintage.
TEL / TOKYO ELECTRON Trias Ex-II is a complex etcher/asher equipment designed for specialized substrate preparation in a variety of prototyping, production and research environments. The system offers superior patterning capabilities and tight process control to create everything from high-resolution lead frames to integrated circuits (ICs). The unit is is a combined etch/assemble machine comprised of numerous sub-systems. It is equipped with a main process chamber, containing both etching and assembling technologies, a series of load lock chambers, a control console and a plasma source power supply. The tool also utilizes a real-time data acquisition and analysis package. The process chamber is made up of two parts, the etch chamber and the assemble chamber. The etch chamber is responsible for the creation of patterns on the substrate material. This chamber utilizes advanced gas and plasma chemistry to create high resolution patterns, while the assemble chamber is responsible for the placement of components on the substrate, such as resistors and capacitors. The two chambers share a common substrate loading and unloading procedure. The asset also incorporates a series of load lock chambers which are located between the etch and assemble chambers. These chambers assist in the etch process by providing a controlled environment with low oxygen levels which assists in masking layers and reactivities. In addition, a control console is used to monitor and manage the operation of the model. The console consists of a user interface, electronics, and software components. These components include the equipment controller, primitives, macro processor, safety monitors, calibration software, and additional features. Together these components provide the user with the tools necessary for precision operation of the system. Finally, the unit also includes a source power supply which is responsible for driving the plasma chemistry in the etch chamber. Overall, TEL Trias Ex-II etcher/asher machine is a highly effective tool for substrate preparation and advanced pattern formation. The tool is easy to operate and provides an ideal platform for both prototyping and production requirements. With its advanced process control, efficient gas and plasma etching capabilities, and wide range of other features, TOKYO ELECTRON Trias Ex-II is an excellent choice for precision device manufacture.
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