Used TEL / TOKYO ELECTRON Trias SPA #9205617 for sale

TEL / TOKYO ELECTRON Trias SPA is an etcher / asher that is designed for deposition of thin films onto substrates. It is designed to be able to provide a uniform thin film deposition over a specified area with exceptional precision and control. This etcher / asher is built with an operating equipment that provides an intuitive user interface. It utilizes a plurality of input/output devices, such as a computer, a touch panel, and a display, to provide full control over the operating process. The system includes a deposition chamber, a vacuum unit, a gas delivery machine, and a pumps and valves tool. It also includes an RF power generator and a control unit that controls the process. The etcher / asher utilizes a high-frequency plasma generator to create a uniform plasma within a deposition chamber. The plasma generator is tuned to a predetermined frequency for the desired thin film material. This allows for precise control of the sputtering process, providing a uniform deposition across the entire substrate. The etcher / asher can be used to deposit various materials, such as aluminum, zinc, and titanium, as well as a variety of films, including crystalline and amorphous materials. The asset can also deposit metals, such as copper and silver, onto a wide range of substrates, including silicon wafers, plastic sheets, and glass. Additionally, it can be used to deposit substrates from a variety of angles, including vapor-deposited, colloid-deposited, and electron beam-deposited materials. It also has the capability to deposit multi-layered films. The etcher / asher is equipped with a set of features that allow for accurate and controllable film thickness. These features include customizable deposition speed, vacuum level, pressure, RF power, and chamber temperature levels. Additionally, an inert gas shield can be used to control the deposition rate and prevent the deposition of unwanted materials, as well as to provide an inert environment within the deposition chamber. The etcher / asher is able to provide a uniform, ultra-precise deposition rate and process control over a range of temperatures and gas flows. It is capable of depositing thin films with thicknesses up to 50nm and larger with repeatable reproducibility and uniformity from run to run. This increases the precision of the product and decreases variation from run to run, resulting in higher yield and better performance. TEL Trias SPA etcher / asher is a reliable, durable product that can provide a uniform deposition of thin films, with high precision, across substrates. It is easy to use, highly controllable, and can be used to deposit a variety of different materials. It is an efficient tool that can help increase the quality and productivity of any film deposition process.