Used TEL / TOKYO ELECTRON Trias SPA #9315410 for sale

ID: 9315410
Wafer Size: 12"
Vintage: 2002
CVD System, 12" Mainframe EFEM YASKAWA XU-RVM4100 SHINKO BX80-070641-11 SHINKO BX80-070786-11 2002 vintage.
TEL / TOKYO ELECTRON Trias SPA is an advanced etcher/ asher, designed for deep etching of wide range of materials. This etching/ashers are equipped with a silicon etching capability of up to 500μm. TEL Trias SPA is capable of providing etched patterns with features of up to 3.5μm, with excellent accuracy and excellent pattern repeatability. The etcher/asher is ideal for etching of a wide range of materials, ranging from silicon to other substrates, such as quartz, ceramic, glass, ITO, and other materials. The etcher/asher achieves excellent profile control and minimal feature overetching, enabling precise created patterns. TOKYO ELECTRON Trias SPA etcher/asher is equipped with standard components such as a quartz chuck and a quartz etchant wafer holder. It is designed as a compact equipment, which occupies very little floor space and thus allows for higher process densities. The etcher/asher is user friendly and can be operated easily. The system is equipped with a variety of control programs that enable users to select the optimal process condition and achieve the best etching result. The unit also allows users to monitor the etching process and make sure that the etchant is ideal for the material. Trias SPA etcher/asher is suitable for process control of a wide range of materials and substrates. It can handle both anisotropic and isotropic etching processes. The etcher/asher is equipped with multiple advanced safety features to ensure a safe etching process. It is equipped with a full-color graphical user interface (GUI) that simplifies control of the machine. The GUI also allows for traceback data to be tracked over time to ensure accuracy and uniformity of the etching process Additionally, TEL / TOKYO ELECTRON Trias SPA etcher/asher has a variety of features that enable users to monitor and maintain the machine. It offers both manual and automatic substrate cleaning capability, narrows process windows for specific wafer sizes, and simplifies process maintenance. Additionally, the etcher/asher supports both batch-level programming and single-wafer programming, making it ideal for a wide variety of etching applications. All in all, TEL Trias SPA etcher/asher is an advanced, reliable etcher/asher tool that can produce accurate, reliable results, while also offering valuable process control capability, process monitoring, and safety features. It is suitable for a wide variety of etching and other applications and is a great choice for laboratories and production facilities alike.
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