Used TEL / TOKYO ELECTRON Trias TI/TIN #293627026 for sale

TEL Trias TI/TIN is an etch/ash process equipment designed to perform high precision etching or ashing of semiconductor substrates. It is designed to be used in thin film semiconductor fabrication, and is ideal for etching or ashing of ultra-thin films or layered substrates. The equipment is composed of a process chamber and a highly precise substrate carrier, and offers a unique combination of high throughput and a high level of surface accuracy and stability. The process chamber is a dual-chamber system, with a process and an exhaust chamber, separated by a floating diaphragm. This allows for precise control and measurement of pressures, temperatures, and flow rates within the chamber. This system is especially useful for high precision etching, as it minimizes the formation of wear marks and damage to the substrate. The temperature of the chamber is dynamic, allowing for temperature ranges from 200°C to 400°C, allowing for a variety of uses, such as chemical vapor deposition (CVD) processes. The pressure of the chamber is also adjustable, and can be set to a range of 1 to 10 Torr. The Trias TI/TIN also offers a highly precise substrate carrier, which is capable of supporting substrates up to 4-inches in diameter. The substrate carrier suspends itself using air bearings, and provides a level substrate support during the etching/ashing process. The substrate carrier is also capable of motion in three axes, allowing for precise patterning and alignment of the substrate during the process. TOKYO ELECTRON Trias TI/TIN is an advanced tool for etching/ashing of semiconductor substrates, and offers a unique combination of high precision and high throughput, making it an ideal tool for a wide range of applications. The dual-chamber design, dynamic temperature and pressure settings, and the highly precise substrate carrier provides users with a wide range of options for etching and ashing a range of substrates for different applications.