Used TEL / TOKYO ELECTRON Trias #293592929 for sale

TEL / TOKYO ELECTRON Trias
ID: 293592929
Wafer Size: 12"
CVD Systems, 12" Process: Ti/TiN.
TEL / TOKYO ELECTRON Trias is an etcher/asher designed specifically for semiconductor device fabrication. It is a single-wafer tool with a 200mm wafer capacity. It adopts the lateral horizontal processing technology to optimize the uniformity of the etched surface. The etcher contains a rotating substrate with adjustable size and a liquid-assist etch feature. This feature allows for a uniform etching speed and a large area of evenly distributed etching. The substrate is heated and pressurized to increase etching speed, while at the same time maintaining cleanliness. Additionally, the etcher has a high degree of precision, which ensures that the shape and size of the etched datasheet can be accurately reproduced. The etcher has a single-chamber chamber capable of accommodating up to 200mm wafers. This allows a wide range of substrates to be processed, including polysilicon and silicon oxynitride. The etcher is also equipped with reactive-ion etching (RIE) for deep etching. The dual-mode ion source allows for a variety of etching materials to be used, including fluorides, hydrofluorides, boranes, halides and nitrides. The etcher is designed to minimize contamination and cleanliness issues. It utilizes a reverse cleaning system which reverses the etching process, providing a clean post-etch surface. In addition to this, the system has a tunnel clean chamber, which can be loaded with water vapor and an inert gas to ensure a high level of cleanliness. The etcher has an easy to use software interface, which can be tailored to a variety of etching patterns. The user can adjust the time to maintain steady etching speeds, or the speed to provide extra etching on critical areas. The system also includes a scan schedule to ensure that the wafer is exposed to the specified processing parameters. Overall, TEL Trias etcher/asher is perfect for accomplishing tasks in a variety of substrates with excellent control over etching speed and uniformity of surface. It is a reliable and efficient tool to produce accurate results quickly, which ensures a high level of productivity and cost-effectiveness.
There are no reviews yet