Used TEL / TOKYO ELECTRON Trias #293605722 for sale
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TEL / TOKYO ELECTRON Trias is an advanced etching/ashing (etchback) machine used for fabricating and machining advanced semiconductor devices and other complex devices. TEL Trias was designed as a multi-functional machine with both wet and dry etching capabilities, allowing it to perform etched/ashed processes in both a controlled environment and with a wide range of materials. TOKYO ELECTRON Trias has a precision digital control equipment which provides high repeatability and accuracy in the etching/ashing process. Trias features two etching/ashing chambers, each of which supports a variety of cupping/etchback processes. The first chamber, the wet etching chamber, is equipped with a vacuum and a liquid-based etchant. The wet etching chamber is suitable for processing wafers of both materials, such as Amorphous Silicon and Poly-Si Ge, as well as providing superior etching/ashing of aluminum and copper surfaces. The second chamber, the dry etching chamber, supports a dry, non-vacuum etching/ashing process. This chamber is suitable for processes such as polyimide thinning, advanced patterning and dry film etching. TEL / TOKYO ELECTRON Trias is designed with a wide range of components, such as an oxygen-inflow system, self-diagnosis unit and an RF power supply, to ensure optimum etching/ashing performance. TEL Trias also has an automated wafer handling machine, which enables a wide variety of wafer sizes suitable for etching/ashing to be used, including substrates and layers with a thickness of up to 1 mm. The fully automated process control is capable of tracking and controlling etching/ashing parameters during the process. Aside from being an effective etching/ashing machine, TOKYO ELECTRON Trias is also powerful when it comes to cleaning and drying of the wafers. Its cleaning process includes degasification of heavily labelled and contaminated surfaces, automated nitrogen bubble generation and liquid treatment. Trias also has a multifunctional drying feature, which is capable of drying both fine particles and large-size particles with high efficiency and speed. TEL / TOKYO ELECTRON Trias is an excellent example of a machine with the capability to produce advanced semiconductor devices and other complex devices with both wet and dry etching/ashing processes at high accuracy and repeatability. TEL Trias' wide range of process capabilities, easy to use automated controls and high level of process repeatability, make it an ideal etcher/asher for industrial and research/development applications.
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