Used TEL / TOKYO ELECTRON Trias #293622393 for sale

TEL / TOKYO ELECTRON Trias is a state-of-the-art etcher/asher equipment used for a variety of semiconductor processing applications. It utilizes inductively coupled plasma (ICP) technology to provide powerful, precise etching and ashing operations for the fabrication of advanced semiconductor devices. With a large, temperature-controlled process chamber, coupled with a temperature-stable plasma source, TEL Trias is capable of a variety of processes, including photoresist etching, oxidation, and ashing. The advanced etching technology employed by TOKYO ELECTRON Trias allows for excellent selectivity and uniformity of etched features, as well as accurate and reproducible processing of ultra-thin films. The wafer process area of Trias is designed to provide optimal temperature control and uniformity. This is accomplished through the use of eight cylindrical quartz plates which are cooled by circulating water. Each plate is separated by 8mm and can be adjusted for adjustable temperature uniformity with 360° repeatability. This ensures accurate etching results and prevents faulty placement of wafers during processing. The wafer transfer system also allows for quick and accurate placement of wafers onto the heater plain using inert gas to prevent contamination. TEL / TOKYO ELECTRON Trias utilizes a separate, enclosed CDA chamber that is used to provide the necessary chemicals and gases for etching and ashing. This chamber provides a stable work environment, allowing for effective delivery of reagents, as well as gas mixing and purging, for improved process reproducibility. The unit also includes an advanced vacuum control machine with a load lock for efficient transfer of wafers into and out of the chamber, as well as cutting down on contamination from the process environment. TEL Trias is also capable of optimizing etching processes according to the specific application being performed. This includes capabilities such as adjustable etch rate, adjustable homogeneity and uniformity, and adjustable etch depth, all of which can be precisely adjusted for any given process, allowing for improved yield, accuracy, and repeatability. The tool also offers advanced monitoring and control features such as temperature feedback control and endpoint detection, allowing for automatic measure and feedback of process parameters. In conclusion, TOKYO ELECTRON Trias is an advanced etch/ash-asset designed to provide precise etching and ashing operations, along with adjustable processing parameters that can be tailored to specific applications. The model's stable work environment, temperature-uniform processing, and advanced monitoring and control features make it an invaluable tool for the fabrication of a variety of advanced semiconductor devices.