Used TEL / TOKYO ELECTRON Trias #293778168 for sale

TEL / TOKYO ELECTRON Trias is an advanced etching / asher system used for precision patterning and material deposition of electronic components. It is capable of etching patterns in a wide variety of substrates, and has become an industry standard for semiconductor packaging and interconnectivity. TEL Trias utilizes a modular platform that can be customized for different applications, allowing it to efficiently carry out a variety of etching and material deposition tasks. TOKYO ELECTRON Trias consists of a primary unit, a gate unit, a loader/unloader, a scanning mechanism, and a transfer mechanism. The primary unit of Trias is comprised of a cluster of electron beam evaporation sources (EB VPS) and a plasma chamber. The EB VPS is used to deposit the etched pattern over the substrate surface, providing unparalleled quality and precision by controlling the amount of material applied. The plasma chamber is an enclosed space that contains the plasma generated by the EB VPS, and is used to etch the pattern into the substrate. The gate unit of TEL / TOKYO ELECTRON Trias contains a gate valve and several control and monitoring devices, which are used to control the amount of material that passes to the substrate surface from the EB VPS. The loader/unloader provides an automated way of transferring between the substrate load/unload station and the scanning mechanism. An automated action involving pick and place tools helps to load/unload substrates in a more efficient manner. The scanning mechanism includes a spindle head with a scanning motion, scanning through the substrate in multiple directions to properly etch the pattern. The transfer mechanism includes an automated tool that transfers the substrate as needed between the substrate loader/unloader and the scanning mechanism. This provides an efficient transfer with minimal mechanical wear and tear. TEL Trias is a reliable etching and material deposition system with numerous features that make it an industry standard for semiconductor packaging and interconnectivity. Its modular design and advanced electron beam vapor deposition technology provides precise, accurate, and repeatable patterning and material deposition of electronic components. The highly efficient loading/unloading mechanisms and automated tools provide a repeatable, automated process, making TOKYO ELECTRON Trias an ideal choice for etching and deposition of complex patterns on various materials.