Used TEL / TOKYO ELECTRON Trias #293824449 for sale

TEL / TOKYO ELECTRON Trias
ID: 293824449
Metal Chemical Vapor Deposition (CVD) system 3D NAND dedicated chamber.
TEL / TOKYO ELECTRON Trias is a state-of-the-art etcher and asher used in the semiconductor industry. It is a reactive ion etch (RIE) equipment that boasts industry-leading performance and reliability. It is widely used in the fabrication of semiconductor chips, including the etching of microelectronic structures, polymers, and nanostructures. TEL Trias is a multi-process system that can perform etching, ashing, and cleaning processes in one unit. TOKYO ELECTRON Trias utilizes an inductively coupled plasma source coupled with HDPCVD (High Density Plasma Chemical Vapor Deposition) to deliver a highly optimized etch process. Trias employs a sophisticated control machine that enables smooth, high-accuracy etching/ashing operations. It also offers a variety of chamber configurations to suit a range of applications. Equipped with its Chamber FirstTM sensor, it is capable of monitoring the chamber interior and preventing contamination. Furthermore, TEL / TOKYO ELECTRON Trias offers an innovative MultiChamberTM feature which enables users to perform concurrent processes in multiple chambers. This feature is ideal for many etching processes as it reduces cost and time significantly. Additionally, TEL Trias features a FlexibleGasTM tool which makes it possible to select different kinds of gases and combinations depending on the process needs. TOKYO ELECTRON Trias is also highly efficient in managing process data. It has a ProcessSmartTM data collection asset which makes it possible to monitor and evaluate process data in real time. The advanced analytics model provides users with valuable insights into their processes to optimize productivity. Finally, Trias is designed to minimize potential human errors and reduce maintenance costs, making it an ideal choice for manufacturing semiconductor chips in a cost-effective manner.
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