Used TEL / TOKYO ELECTRON Trias #9094190 for sale

Name: TEL / TOKYO ELECTRON Trias
Brand: TEL / TOKYO ELECTRON
SKU: 9094190
Availability: InStock

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Etchers / Ashers

Manufacturer

TEL / TOKYO ELECTRON

Model

Trias

ID: 9094190

Wafer Size: 12"

Vintage: 2005

CVD System, 12" (3) TDK TAs3000 FOUP loaders SPA-N components Chamber parts: Manufacturer Model Description TEL - Slot antenna TEL - Susceptor heater TEL - Quartz liner TEL - Susceptor cover TEL - Baffle cover MKS 626B01TBE Capacitance manometer (133Pa) MKS 626B11TBE Capacitance manometer (133Pa) MKS 623B-28316 Capacitance manometer (133kPa) V TEX IRF-07084-2-01 Gate valve Vacuum system: Manufacturer Model Description EDWARDS STP-A1603B Turbo molecular pump Fuji Imvac HV-40N-R Throttle valve on a high pressure line VAT 65046-PH52-AHS1 Throttle valve on a low pressure line SMC XLA-40G-M9 Hi-vac valve on a high pressure line SMC XLA-63A-M9 Hi-vac valve on a low pressure line Exhaust system: Manufacturer Model Description Tokyo Flow Meter FF-MRA85-1-TYL1 Flow meter for cooling water FF-MRA80-1-TYL1 Toyokokagaku RS-2000CA / RS-2000F-6417 Water leak sensor SMC INR-497-100-X048 Chiller Others: Manufacturer Model Description Nihon Koushuha MKN-502-3S2B03-OSC H-Wave power supply unit Nihon Koushuha AMC-95Q1-CONT5 Auto matching unit 2005 vintage.

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TEL / TOKYO ELECTRON Trias is a plasma etcher/ascher designed for semiconductor device production and research & development. TEL Trias etcher features a multi-gun thermal PECVD (Plasma-Enhanced Chemical Vapor Deposition) source, enabling high-speed, highly detailed etching on multiple layers of materials. It also has a patented Applied Negative Bias (ANB) technology for controlling plasma density, enabling uniform etching depth across all substrate materials. The etcher is easy to operate, with automated process control and programmable parameters, allowing operation with low cost and maximum yield. TOKYO ELECTRON Trias etcher's substrate temperature can be programmed up to 370C for precise etching. The process operates under low pressure, and the etching process is done in a vacuum chamber using current-controlled bias power. Trias etcher is capable of producing high accuracy etchings and has high process repeatability and small process errors. It can also etch materials including polysilicon, SiO2, and III-V materials with precision. TEL / TOKYO ELECTRON Trias etcher has anti-contamination measures in place that include a sapphire susceptor, fluorocarbon purge gas, and source temperature monitor. The etcher is designed to minimize particle contamination, and has an advanced low-particle filtration system for additional cleanliness. With its high throughput, easy operation, and sophisticated plasma control, TEL Trias is a top-tier etcher for any semiconductor device production or research & development process.