Used TEL / TOKYO ELECTRON Trias #9118411 for sale

TEL / TOKYO ELECTRON Trias
ID: 9118411
Wafer Size: 12"
Vintage: 2006
Chemical Vapor Deposition (CVD) system, 12" Cassette to cassette (2) TiCl4 Ti (2) TiCl4 TiN Transfer Load lock: A and B KOGANEI Gauge STEC VC131004ST20 Vaporizer Pump: LLM Dry pump TM Dry pump (5) Dry pumps Valve: FUJIKIN Manual valve (N2-1/N2-2/N2-PF/Ar) Manual valve (Dry air line) (2) LLM1.2 Door valves (2) V TEX I-I-98009-2-1 Gate valves KITZ Gate valve Regulator: VERIFLO SQ-MICRO-HF-50-2P-UPG-601 (N2-1/N2-2) VERIFLO SQ-MICRO-130E-50-UPG-6405 (N2-PF) VERIFLO SQ-MICRO-602PUPGPA (Ar) KOGANEI SQ-MICRO-30-2P-UPG-6028 VERIFLO SQ-MICRO-602PUPGPA (Dry air line) Sensor: (2) SUNX DP2-22 Pressure sensors LEYBOLD PS.12/PS.32 TSR211S LEYBOLD PS.31 INFICON VSA100A LEYBOLD TSR211S Pirani sensor Filters: N2-PF Dry air line Manometer: MKS 626A01TDE LEYBOLD CDG160A-S 1330PA LEYBOLD CDG160A-S 133PA RF Power: KYOSAN HFK15Z-TW1 RF Power supply KYOSAN EAKIT RF Matcher MFC: Make / Model / Gas / Value HITACHI / SFC1470FAMC-4UGLN / CLF3 / 500 SCCM HITACHI / SFC1480FAMC-4UGL / Ar / 2 SLM HITACHI / SFC1481FAMC-4UGLN / He / 5 SLM HITACHI / SFC1480FAPDMC-4UGL / NH3 / 600/2000 SCCM HITACHI / SFC1480FAMC-4UGL / N2 / 2 SLM - / - / Ar 300 SCCM / - / N2 300 SCCM 2006 vintage.
TEL / TOKYO ELECTRON Trias is a high-speed etcher/asher designed to give consistent etching results on a wide range of materials, including metals, semiconductor materials, and ceramic substrates. It utilizes advanced vacuum etching technology to enable high accuracy and repeatability. The etcher/asher can be used in a variety of applications, such as sputter etching, photoresist planarization after etchback or stop-etching, film stress relief, and forming recesses in hard-to-reach areas. The etcher/asher is equipped with a vacuum equipment that allows the etching/ashing area to be precisely controlled. It features an advanced etching chamber and a vacuum shield that maintains cleanroom levels inside the system. Furthermore, it is equipped with an optical unit and Auto-Collimation Probe (ACP) to accurately measure and set up the etching conditions. This etcher/asher is equipped with a powerful high-frequency RF generator to provide energy to etch a wide range of materials. The etching process is monitored and controlled by an integrated computer machine, which can also be used to fine-tune etching parameters according to the material being processed. The tool is also equipped with software to adjust processing parameters, measure etching rate, and compile processing results. This etcher/asher is equipped with various functions and tools that enable it to be used for a variety of applications. For example, it has a gas asset for introducing reactive gases to the etching chamber, as well as a chemical delivery model for adding chemicals during etching. Furthermore, it is equipped with a high-temp anodizing chamber that can be used to etch and planarize wafers and other materials. In terms of safety, TEL Trias has been designed with safety features such as a special emergency stop (E-STOP) feature for stopping the etcher/asher, an ozone-free exhaust equipment, and an automatic shutoff function that will turn off the RF generator in case of any compliant issues. The system also has an automatic safety unit for detecting hazardous levels of ozone. Overall, TOKYO ELECTRON Trias is a high-performance etcher/asher that is capable of achieving consistent etching results on a wide range of materials. It is equipped with advanced etching technology, safety features, and various tools for handling different etching and ashing processes, making it an excellent choice for various semiconductor device manufacturing applications.
There are no reviews yet