Used TEL / TOKYO ELECTRON Trias #9226880 for sale

TEL / TOKYO ELECTRON Trias is an etcher/asher that is specifically designed for the removal of oxides, polyimides, metals, and photoresist from substrates. This etcher/asher utilizes chloride-based plasma etching technology to remove unwanted materials quickly and precisely with minimal dielectric damage and precise etch pattern control. TEL Trias is suitable for use on oxide based substrates such as SiO2 with etching times of less than20 minutes/run, and features a wide operating temperature range of -35°C to +35°C. The etching process of TOKYO ELECTRON Trias utilizes three main components: an etching gas, an RF power supply, and an etching plate. The etching gas is propelled through the etching plate where it converts to a low pressure plasma. This plasma reacts with the target materials on the substrate, directly ionizing it and kicking off volatile particles, while simultaneously heating the target materials allowing them to be etched away with hardly any macroscopic area damage on the substrate. The RF power supply produces an RF voltage that is also used to excite the etching gas and generate low pressure plasma. The RF generator features a wide range of operating frequencies from 0.3 MHz to 1MHz and a wide range of RF powers from first-pulse to second-pulse to an arbitrary third-pulse. The faster pulses are typically for increased arc-down sputtering (hard material removal) while longer pulses allow for increased macroscopic area damage. The exact combination of power and frequency can be adjusted to create the optimal etching condition and patterning of materials on the substrate. The etching plate of Trias is constructed from quartz and designed to uniformly distribute the plasma over the surface of the substrate, designed for maximum etching efficiency and uniformity. With the capability of up to 3" substrate size and a wafer step size of as low as 0.1mm, the etching plate ensures that uniform etching is achieved over the entire substrate. The etcher/asher TEL / TOKYO ELECTRON Trias is an efficient and precise tool for the accurate removal of oxides, polyimides, metals, and photoresist from substrates. With its easy-to-use interface, adjustable frequency and power settings, and quartz etching plate, TEL Trias is the perfect solution for etching and ashing substrates for research and production application.