Used TEL / TOKYO ELECTRON Trias #9235248 for sale

TEL / TOKYO ELECTRON Trias is an advanced etcher / asher equipment designed for efficient and precise in-line processing. This system utilizes electron beam technology for high-resolution patterning and etching of materials on a wide range of substrates. The robust design of the unit ensures reliable results for critical microelectronic applications, including photomasks, alignment layers, and backgrinding. TEL Trias machine consists of four key components: the electron beam column, the ion emission side, the linear scanning stage, and the gas distribution tool. The electron beam column consists of an electromechanical unit, which provides both rapid motion and high accuracy for precise alignment or nanopatterning. The ion emission side contains a linear ion beam generator and detectors, as well as ion exchanger and emission energy control components. The linear scanning stage carries the electron beam column across the substrate to perform repeated patterning operations. Finally, the gas distribution asset stores, supplies, and purifies the processing gas for patterning the substrate. All of these components combine to make TOKYO ELECTRON Trias model a fast and accurate tool for implementing critical device processes. Trias equipment also features an advanced process control interface. It is capable of real-time monitoring and controlling of the etching process, and permits users to quickly adjust parameters, monitor the progress of the process, and ensure maximum precision. Furthermore, the advanced data analysis program incorporated in the system provides comprehensive device data, which serves as a basis for optimization of the etching process. All of these features make TEL / TOKYO ELECTRON Trias unit an ideal tool for precise etching and patterning of materials across a wide variety of substrates. Overall, TEL Trias is an advanced etcher / asher machine designed for efficient and precise in-line processing. It combines the versatility of electron beam technology, the superior accuracy of the linear scanning stage, and the advanced process monitoring capabilities of the data analysis program to create a powerful tool capable of accurately etching and patterning materials on virtually any substrate. Furthermore, the advanced process control interface makes controlling the etching process and optimizing device performance easier than ever before.