Used TEL / TOKYO ELECTRON Trias #9235254 for sale

TEL / TOKYO ELECTRON Trias is an advanced etcher/asher equipment produced by TEL, a leading supplier of process equipment for the semiconductor industry. TEL Trias system combines state-of-the-art etch and ash technology with superior control systems to provide a highly efficient and precise method for etching and ashing various materials. TOKYO ELECTRON Trias uses a plasma source to etch and ash substrates such as wafers, masks, and dies, in a safe, controlled, and environment friendly manner. The unit includes an LPCVD underlayer deposition chamber, a reactive ion etching (RIE) chamber, and an ash chamber. The LPCVD underlayer chamber provides simultaneous deposition of ALD and LPCVD films in a single chamber with high precision and stability. The RIE chamber etches shallow and deep structures with a highly uniform trench profile. Additionally, the RIE chamber includes a deep suppression plasma source that ensures deep trenches etching in high aspect ratio structures. The ash chamber of Trias is responsible for removing certain materials from the substrate surface, such as polymers, oxides, nitrides, metals, and other materials. The ash machine is equipped with a high density plasma source that provides high etching rates and uniformity across the substrate surface. Additionally, the ash process is carried out in a safe, inert atmosphere, shielding the substrate from oxidation and contaminations. TEL / TOKYO ELECTRON Trias tool also features an advanced control asset that ensures precise control over the etching and ash processes. This ensures substrate-to-substrate uniformity, repeatability, and consistency across multiple substrates. On top of this, the model operates with high efficiency as the etching time is reduced and the possibility of rework is minimized. Overall, TEL Trias equipment is a state-of-the-art etcher/asher that combines advanced etch and ash technology with superior control systems to ensure maximum efficiency and accuracy in etching and ashing various materials. TOKYO ELECTRON Trias system is suitable for various vacuum and plasma processes, such as LPCVD, plasma etching, and ash. Furthermore, its advanced control unit ensures precision control over the etch and ash process, and its high efficiency guarantees short etching times and minimal possibility of rework.