Used TEL / TOKYO ELECTRON Trias #9284866 for sale

TEL / TOKYO ELECTRON Trias is an etcher manufactured by TEL, a leading semiconductor equipment supplier. TEL Trias is a medium-sized etcher designed for etching critical layers in semiconductor device fabrication processes. Its small size makes it ideal for use on production lines, while its advanced features, such as its high throughput, make it suitable for high precision etching processes. TOKYO ELECTRON Trias is capable of producing etches with small-length features, and has a wide range of etching and process capabilities that make it suitable for etching high-end applications such as advanced semiconductor device fabrication. The etcher offers various etching techniques, such as isotropic dry etching, reaction ion etching (RIE) and wet etching. Trias can be configured and tailored to process a range of different films, from thin dielectrics to ultra-thin layers of silicon. In addition, TEL / TOKYO ELECTRON Trias includes a number of technologies, such as Multi-Method Process Automation and Edge-Profile-Optimized interface (EPOI), that allow the etcher to be adjusted optimally to specific etch processes. TEL Trias is equipped with precision measurement systems, which enable it to accurately measure the etch rate, uniformity, doping profile, and other process parameters. These systems also enable TOKYO ELECTRON Trias to maintain process consistency and stability. The etcher also features a numbe of safety features, such as fire and gas detection and overpressure sensors, to ensure the safety of the production environment. Trias is also equipped with a number of advanced features, such as the ability to select multiple etch processes, follow-up process control, recipe generation, and automatic process optimization. These features allow users to quickly customize recipes to create complex etch patterns, and further improve the efficiency and productivity of the entire etching process. Overall, TEL / TOKYO ELECTRON Trias is an ideal etcher for medium-sized production lines. Its features and capabilities make it suitable for critical etching processes, and its ability to be tailored to different processes, combined with its measurement and safety systems, make it a suitable well-equipped system for etching high-precision semiconductor devices.