Used TEL / TOKYO ELECTRON Trias #9294403 for sale

TEL / TOKYO ELECTRON Trias is a highly reliable etcher/asher equipment that provides single-hole or multi-hole patterning of a wide range of materials. It is designed with advanced features that enable users to easily and precisely etch patterns into various materials, such as semiconductors, multi-layer films, and gold plating. The efficacy of TEL Trias system is the result of a combination of several key features, such as high ablation rates, short etching times, and adaptability to challenging etching parameters. The high ablation rate of TOKYO ELECTRON Trias makes it possible to etch small patterns such as fin lines, contact holes, and trenches into materials with very high precision. The unit consists of a positioning machine, a laser source, and a beam delivery tool, all of which work in concert to quickly and accurately perform etching. The asset also enables users to adjust parameters such as pulse energy, beam size, and etch speed in order to achieve the desired etch results. Trias's short etch time is due to its high-efficiency ablation rate, as well as its ability to work on materials with complex geometries. The model has multiple etching modes, including multi-masking, which allow users to etch multiple patterns on a single batch of material in a single process. This is particularly helpful when designing complex integrated circuits, as it eliminates the need for multiple etching processes - thus, saving time and money. Additionally, TEL / TOKYO ELECTRON Trias can be used to etch challenging materials, such as copper, silicon, and gold-plated substrates. It is able to achieve this by using specialized etch chemistries and laser sources that can precisely adjust the energy and pulse width of the laser beam. This enables users to effectively etch different materials that might otherwise require multiple etching processes. In summary, TEL Trias is a highly reliable etcher/asher equipment with advanced features that allow users to easily etch precise patterns into a variety of materials. Its high ablation rate, short etching times, and ability to etch challenging materials make it a great choice for any etching application.