Used TEL / TOKYO ELECTRON Trias #9357255 for sale

TEL / TOKYO ELECTRON Trias is an etch/ashers type surface processing machine that is designed for use in a variety of materials processing industries. TEL Trias series of machines are specifically designed for both etching and ashing of semiconductor substrates. They are specifically engineered to provide consistent processing results that meet the requirements of various customer applications, including fine-pitch circuit etch/ash, ultra-barrier etch/ash, contact metal etch/ash, and trench etch/ash, among others. TOKYO ELECTRON Trias series is designed for use with both Ar and CF4 gas supply systems, allowing users to tailor the results to their specific application requirements. It features a modular design which allows users to easily upgrade or customize the equipment components to accommodate for increasing capacity and features. In addition, the system can be configured to operate with either manual or automatic processing of the substrates. At the heart of Trias is a high-frequency inductively coupled plasma (ICP) source, which is designed to ensure the most precise and cost-effective etching and ashing operations. The ICP source is adjustable, allowing users to adjust the voltage, current, and resonance frequency depending on the substrate material and the etching/ashing operation being performed. This adjustable ICP source allows for more precise processing, as well as a more uniform etching and ashing over large areas. TEL / TOKYO ELECTRON Trias unit utilizes an on-board vacuum routing machine to ensure excellent throughput capabilities and uniform etching and ashing. This vacuum routing tool also ensures uniform gas flow into the ICP source. A dynamic temperature control feature also helps to provide repeatable etching and ashing results while optimizing gas consumption. Additionally, TEL Trias is designed to provide an efficient thermal management asset which helps to maintain surface temperature of the substrate, ensuring precise control over the etching and ashing processes. TOKYO ELECTRON Trias series also includes a variety of helpful features such as wafer transfer, a wafer individual cooling channel, process monitoring systems, and remote monitoring capabilities. This allows users to view and monitor the processing conditions in real-time, ensuring consistent results and limited downtime. Overall, Trias series of etch/ashers is an ideal choice for a variety of materials processing industries. The adjustable ICP source, on-board vacuum routing model, and dynamic temperature control features ensure that users will receive precise and repeatable etching and ashing results that will match their application needs. With its versatile features, TEL / TOKYO ELECTRON Trias series is an excellent choice for etch/ashing operations.