Used TEL / TOKYO ELECTRON Trias #9362299 for sale

TEL / TOKYO ELECTRON Trias
ID: 9362299
Wafer Size: 12"
Vintage: 2004
CVD System, 12" 2004 vintage.
TEL / TOKYO ELECTRON Trias is a next-generation etch/ash platform for high-end semiconductor and MEMS manufacturing. It is an automated equipment capable of etch/ash over various materials on wafer scale. The system suite is built around the well-established TEL Trias platform, which is used by leading fabrication facilities for the production of advanced devices and components. TOKYO ELECTRON Trias is capable of performing etching/ashing processes for a variety of materials including silicon wafers, quartz, low-k dielectrics, copper, tungsten, and more. It utilizes Trias process control and chamber process optimization systems for precise process control and a variety of reactor configurations. All these features allow for non-invasive, low temperature etch/ash with high yield. TEL / TOKYO ELECTRON Trias is equipped with a highly secure, ultra-fast Ethernet port to enable users to interface with the local area network or cloud storage and transfer process files. The platform also has an advanced End Point Control status monitoring which can be used to monitor unit events, product completion, chamber temperature/pressure, and tool total run time. TEL Trias delivers superior performance with precise etching/ashing of small features due to its high-precision components and patented technologies. It provides users with the high repeatability, production throughput, and productivity that are needed for advanced production of leading-edge devices. The tool also has an improved process control machine which is capable of monitoring user input and inputs from various tools, making it easier for users to monitor process parameters. Finally, TOKYO ELECTRON Trias is an easy-to-use tool that will improve safety and quality by allowing users to take advantage of cloud compute solutions. These capabilities can help reduce down time and enable users to maximize their production throughput and yield. This next-generation etch/ash platform is engineered to provide powerful, reliable performance and to meet the requirements of today's advanced semiconductor and MEMS manufacturers.
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