Used TEL / TOKYO ELECTRON TSP-304 #9355302 for sale

TEL / TOKYO ELECTRON TSP-304 etcher/asher is a highly advanced semiconductor processing instrument designed to perform dry etching operations. Utilizing plasma-based technology, this asher is able to deposit and etch various materials with ultra-high precision and accuracy. It features a multi-chamber setup with five main chambers, each of which has its own specific purpose in the etching process. This includes the main chamber, feedline chamber, reaction chamber, RF chamber, and post-ash chamber. The main chamber houses the sample holder and is kept at a carefully controlled atmosphere to ensure uniform and consistent etching results from wafer to wafer. This chamber is connected to the feedline chamber which is responsible for introducing the etchant and substrate into the main chamber. The reaction chamber is where the plasma is present and is equipped with both a magnetic and electric field to control the plasma density. This field enables the operator to adjust the etch rate and etch selectivity to a particular material. The RF chamber is electrically isolated from the other chambers and acts as a high power source to produce the plasma. This RF chamber can also be used for sequential etching operations, allowing for the fabrication of fine patterns with excellent corner rounding. Lastly, the post-etched chamber is where the wafers are treated in order to ensure that they are free from any corrosive behaviors. To further enhance its performance, TEL TSP-304 is equipped with a variety of safety and diagnostic features. It also comes with a comprehensive graphical user interface that allows the operator to easily monitor and control the etching process. All in all, TOKYO ELECTRON TSP-304 is an advanced etcher/asher capable of producing highly precise and line-defined features with excellent repeatability.