Used TEL / TOKYO ELECTRON TSP-305 SCCM TE #9366004 for sale

TEL / TOKYO ELECTRON TSP-305 SCCM TE is an etcher or asher designed for controlled etching of substrates in a variety of semiconductor device fabrication processes. The etcher is capable of etching and processing up to seven wafers at one time and supports both manual and automated loading and unloading of the wafers for maximum efficiency. The etcher is designed with a single chamber where processing requests, processing parameters, and recipe data can be stored and accessed. The etcher is outfitted with a precision, multimode plasma source to provide superior substrate etching, uniformity, and process repeatability. TEL TSP-305 SCCM TE etcher features a diffusion pump, which can provide up to 2400 liters per minute of high-efficiency pumping. This allows the etcher to perform large etching jobs more quickly and reliably, and also helps to reduce processing costs. An advanced Process Chamber temperature control system is also included to ensure uniform temperatures, even during long processing times, to maintain a high level of substrate etch uniformity. The etcher also features an automatic process control system designed to maintain a highly consistent etch process. The etcher is capable of automatically controlling the etching process by adjusting gas flow rates, pressure, and electrode power as required. This etching control system reduces time, labor, and gas costs associated with maintaining highly consistent etching processes. TOKYO ELECTRON TSP-305 SCCM TE etcher utilizes a multi-level RF generator for direct RF substrate etching. The RF generator is capable of operating at three different common frequencies, allowing for maximum process flexibility. The RF generator is coupled with a high-performance servo motor and direct drive-axis motor to provide superior substrate etching. Additionally, the etcher supports sophisticated wafer U/V encoding, substrate recognition, and defect repair operations. Overall, TSP-305 SCCM TE etcher is a superior etching solution, providing reliable and repeatable etching performance. The etcher can handle a broad range of etching operations, including etching, chemical vapor deposition, and spin-on coating. It features a diffusion pump, automated process control, and a multi-level RF generator, all of which make TEL / TOKYO ELECTRON TSP-305 SCCM TE etcher an excellent choice for controlled and highly consistent etching processes.