Used TEL / TOKYO ELECTRON TSP-30555SSS #293765913 for sale

TEL / TOKYO ELECTRON TSP-30555SSS is an etcher / asher which utilizes higher power plasma, higher speed, and superior temperature control to achieve high-speed, high-quality etching and ashing. TEL TSP-30555SSS consists of an RIE (Reactive Ion Etching) chamber, a plasma source, an exhaust equipment and a remote plasma source, including an MFC (mass flow controller). An advanced internal Faraday-Cage structure allows for high-quality plasma processing, as well as a high etching rate, improved etching precision, and uniform etching over the entire surface area. This etcher is designed for use with a wide variety of substrates, including polymers and metals. The high-speed etching process is achieved by a higher powered plasma source, improved temperature controller and an advanced automated control system. The plasma source is capable of generating up to 1000 Watts of power, allowing for excellent etching and ashing capabilities. The improved temperature controller ensures optimal and consistent temperatures for each etching and ashing process, allowing for uniform and repeatable results. TOKYO ELECTRON TSP-30555SSS also includes a remote plasma source to ensure uniform results across the entire surface area of the substrate. This control unit is managed by a computer program, so that each etch/ash process can be finely adjusted to each individual application. The built in MFC (mass flow controller) can be used to precisely control the reflux rate, oxygen balance, and pressure out of the plasma chamber. Additionally, the exhaust machine effectively evacuates any toxicization and abrasion generated by the etching process, ensuring safe operation and a clean working environment. TSP-30555SSS etcher is capable of providing superior performance for a wide variety of etch/ash processes. Features such as higher powered plasma, improved temperature controller and a remote plasma source, along with an automated control tool and MFC, allow for high etching and ashing speeds, high-quality results and uniform etching over the entire surface area. This etcher is ideal for both practical and research applications, allowing scientists and technicians alike to take advantage of the many benefits of this advanced etching/ashing technology.