Used TEL / TOKYO ELECTRON TSP-3055DD #9252309 for sale

TEL / TOKYO ELECTRON TSP-3055DD is an advanced etcher or asher, capable of delivering high precision substrates for semiconductor processes. It is a single wafer processing tool from TEL, and is designed for use in the production of semiconductor products such as processors, memory, and other integrated circuits. TEL TSP-3055DD is designed to provide a high level of uniformity and speed, making it suitable for a variety of production needs. At the heart of TOKYO ELECTRON TSP-3055DD is an etcher head that is highly precise and able to achieve a high level of uniformity for its functions. The etcher is equipped with diffusion flow control technology, delivering nitrogen-hydrogen gas flow rates of up to 20 milliliters per minute. Its electrode plates are fine-tuned and finely shaped for achieving an optimal etching rate. This enables high throughputs of up to 60 wafers per hour, allowing for the high-speed production of semiconductor parts. The etcher head is also equipped with an APS-3000 positioning system, which provides for precise tool alignment and high-level overlay accuracy. TSP-3055DD is also outfitted with a process control system, integral to the accurate delivery of substrate processes. Process parameters such as etch time and gas flow rate are automatically adjusted based on the type of substrate being processed, ensuring the production of highest-precision parts. The system also allows for the use of a wide range of etchants, increasing the versatility of the tool. TEL / TOKYO ELECTRON TSP-3055DD also comes with an advanced communication module that enables remote monitoring and control of the etcher. This includes remote monitoring of process parameters, which reduces the need for maintenance personnel. Additionally, the communication module can be used for tuning the etch recipe for a given substrate, helping to optimize processing times and minimizing wastage. In conclusion, TEL TSP-3055DD is a highly precise, fast, and versatile etcher or asher, designed meet the needs of the modern semiconductor production industry. Its features, such as diffusion flow control technology, fine-tuned electrodes, and advanced control systems, make it an ideal tool for producing high-precision, high-volume substrates. Its automation capabilities and remote monitoring make the tool a great choice for production settings, increasing productivity while reducing maintenance overhead.