Used TEL / TOKYO ELECTRON U2e-655II #293660132 for sale

TEL / TOKYO ELECTRON U2e-655II is an advanced etching and ashing equipment for advanced submicron processing and nanotechnology applications. This etcher / asher utilizes multiple wafer use that allows for a wide range of etching and ashing tasks. Its features include a 4 or 8 parallel blocks, support for non-destructive patterning systems, active wafer rotation for improved uniformity and precision, high throughput, and a low cost of ownership. The U2e-665II utilizes different types of etching processes including Reactive Ion Etching (RIE) and Plasma Enhanced Chemical Vapor Deposition (PECVD). RIE allows for the etching of a wide variety of materials including silicon, silicon dioxide, and silicon nitride. PECVD is used to deposit thin films on various substrates as well as thin film structures. TEL U2e-655II also offers a pulsed etch sequence control and a purge system that enables better control of surface contamination for improved repeatability. TOKYO ELECTRON U2e-655II utilizes a high-speed loader arm for improved throughput and a dimension recognition unit for precise, accurate loading of the wafers. The machine is also designed to help reduce the cost of ownership by using multiple chambers that can reduce downtime for maintenance and can increase the tool's productivity. In addition, U2e-655II features an internal mechanical mechanism that prevents particles from becoming charged and entering the plasma chamber. This helps to reduce contamination and improve the asset's overall performance. The model is also designed to be easy to use and has a self-diagnostic mode which helps to detect and resolve errors quickly. Overall, TEL / TOKYO ELECTRON U2e-655II provides a reliable and affordable etching and ashing equipment for nanotechnology and sub-micrometer processing needs. It's advanced features help to increase productivity while reducing the cost of ownership and increasing the accuracy for precision processing.