Used TEL / TOKYO ELECTRON U2e-855II #9363962 for sale

TEL / TOKYO ELECTRON U2e-855II is a state-of-the-art etching equipment used in the microelectronics industry. This etching system combines a plasma-enhanced dry etch process with a chemical vapor deposition (CVD) process. This unit provides superior uniformity, high throughput and low defect rates for etching of both hard and soft materials. TEL U2e-855II offers high resolution and high speed for etching through-holes, trenches, and patterns. The etch process is carried out by ionizing the gas mixture, and then controlling the temperature and energy with magnetically induced, applied electric fields. These microwaves cause a plasma to form, thereby creating a low-temperature, low-pressure environment suitable for etching. Heat is provided externally to ensure sufficient energy is available throughout the etching process. TOKYO ELECTRON U2e-855II has a control panel where users can monitor and adjust chamber pressure, working gas composition, pulse rate, plasma power level and ion energy. An integrated PC-based user interface also allows control and monitoring during the etch process. The machine has a convenient built-in conveyor tool, which moves the wafer steadily through the machine during the etch process. In addition, U2e-855II is equipped with a High Aspect Ratio (HAR) Channel Etching Technology, which enables the user to etch deep, complex patterns in hard materials such as silicon wafers, quartz crystals and ceramic substrates. The HAR technology is also beneficial for producing high three dimensional profiles with minimal surface damage. The asset provides an excellent range of features for a wide variety of applications. For example, TEL / TOKYO ELECTRON U2e-855II is ideal for contact etching, via hole etching, high aspect ratio etching, and for creating deep and complex patterns. It is also capable of processing multiple substrates, and is compatible with all types of photomasks used in the microelectronics industry. Overall, TEL U2e-855II is an advanced etching model suitable for a variety of microelectronic applications. It offers superior uniformity, high throughput and low defect rates, while providing users with sophisticated control and monitoring features. The equipment is suitable for a variety of etching applications and can handle hard and soft material with ease.