Used TEL / TOKYO ELECTRON UNITY 2E 85 DD #9178057 for sale

TEL / TOKYO ELECTRON UNITY 2E 85 DD is an advanced etcher for dielectric layers, including etch back of silicon nitride, silicon dioxide, and etch stop layers. TEL UNITY 2E 85 DD can be used to etch silicon dioxide, silicon nitride, amorphous silicon, and nitride oxides. This advanced etcher also offers the capability to create advanced features and patterns on a wide variety of materials. The efficient and reliable design of TOKYO ELECTRON UNITY 2E 85 DD ensures optimal etch uniformity and precision. The use of a highly reactive, low temperature Argon/Chlorine based chemistries provide excellent control of etch rates and etch anisotropy. Thanks to the Advanced Control Substrate Positioner (ACSP) technology, UNITY 2E 85 DD offers a wide range of substrate sizes and shapes to be accurately and precisely etched. Additionally, the large process window of TEL / TOKYO ELECTRON UNITY 2E 85 DD helps to minimize equilibration time and ensure focus-on-target results. TEL UNITY 2E 85 DD is specifically designed for use in producing the highest quality interconnected field images (IFFs) in semiconductor processing applications. IFFs offer the added benefit of accurate patterning of narrow features, enabling them to be focused with extreme resolution. This is possible due to the superior etching capabilities of TOKYO ELECTRON UNITY 2E 85 DD, as it offers excellent selectivity of etch rates between different materials, fast etch throughput and highly-uniform etch results. UNITY 2E 85 DD also offers superior through-silicon vias (TSV) etching, ideal for etching of narrow features with extremely high density. The minimized feature loading gives great flexibility in positioning of topography layers. Furthermore, the high uniformity of the etching process ensures that these narrow features are accurately etched with a uniform depth. To assist users on their maintenance and troubleshooting needs, TEL / TOKYO ELECTRON UNITY 2E 85 DD is available with on-board diagnostics and data logging capabilities. It features a full closed-loop control for optimization of process results and quality assurance. Finally, a wide array of options and smart features allows for more user-specific process optimization and customization, improving the process cycle time. In summary, TEL UNITY 2E 85 DD etcher offers superior etching capabilities for dielectric layers, tight focus control, large process window, fast etch throughput, enhanced feature loading, on-board diagnostics and data logging capabilities, and a wide array of options and smart features for process optimization and customization.