Used TEL / TOKYO ELECTRON UNITY 2E 85 DRM #9293757 for sale

TEL / TOKYO ELECTRON UNITY 2E 85 DRM is a state-of-the-art etching (or ashing) equipment capable of producing high-quality thin film planarization and metalization patterns with extreme precision for use in various industries. The system consists of a powerful scanning electron microscope (SEM) and a precision-controlled plasma deposition/aspiration chamber. The SEM is capable of producing images with resolutions down to 0.2 nm, and the deposition/aspiration chamber is equipped with multiple nozzles to create highly uniform thin film patterns. To achieve the highest level of precision, TEL UNITY 2E 85 DRM relies on a number of specialized features. The unit uses an advanced electronic beam line scanner to accurately direct the beam, and a multi-staged optical machine to image and control the deposition/aspiration process. The SEM is also equipped with an auto-focus profile optimization module which continually monitors the film thickness, allowing users to make finely tuned adjustments. An integrated computer tool enables fully computerized operation and user-friendly image optimization, as well as powerful analytic and measurement functions. TOKYO ELECTRON UNITY 2E 85 DRM also features a variety of safety measures and controlling systems. These include a asset to monitor the temperature and flow rate of the deposition or aspiration chamber, as well as a built-in gas monitor to ensure safe operation. Additionally, the model is designed to be easy to maintain, with a high degree of accessibility and an efficient cleaning procedure. UNITY 2E 85 DRM is ideal for creating high-quality thin film patterns on difficult-to-etch substrates such as ferrites,Gate Oxides, and dielectrics. The equipment can also produce high-precision contact holes and patterned molding of low-temperature solders and metals. By offering unmatched precision, TEL / TOKYO ELECTRON UNITY 2E 85 DRM enables manufacturers and research institutions to produce the most complex designs with unprecedented accuracy and reliability.