Used TEL / TOKYO ELECTRON UNITY 2E 855 DD #9145475 for sale

TEL / TOKYO ELECTRON UNITY 2E 855 DD is a high-precision, high-throughput etcher / asher for industrial applications. It is engineered for high accuracy, longevity, and reliability, and is suitable for use in semiconductor and MEMS/NEMS industries. TEL UNITY 2E 855DD is a bridge-type planar etcher / asher. It is loaded with a specialized high-current, high-precision ion source, comprising of a combined source for magnetron and multicusp arcing for etching and ashing purposes. The proprietary electronics incorporated in TOKYO ELECTRON UNITY 2 E 855 DD provides up to 5 GHz of RF operating frequency, with pulse capabilities enabling short pulse lengths. This is ideal for ensuring very accurate and repeatable etching capabilities. The unit operates in a wide-range chambers, with a maximum chamber opening of 350 mm, and a maximum operation pressure of 5 Pa. A range of gas inlets and outlets, and advance fixturing solutions are available to ensure optimal matching of the process requirements. The unit offers a wide range of controllable parameters including; pressure, temperature, etch rate, and etch uniformity. The combination of features in TEL UNITY 2E 855 DD allow for a highly flexible and repeatable process control. In addition to its etching capabilities, TEL / TOKYO ELECTRON UNITY 2 E 855 DD also provides ashing capabilities with its advanced plasma technique. Uses of the device includes etching of metals and dielectrics for fabrication of microelectronic devices, as well as high-throughput etching and ashing of resist on semiconductor substrates. It is equipped with a range of safety features, including overheat protection and pressure interlock to ensure safety and security of the equipment. Overall, TEL / TOKYO ELECTRON UNITY 2E 855DD is an advanced etcher / asher capable of achieving very precise etching and ashing processes with a highly repeatable process control. With its wide range of features and advanced technological solutions, it can be used in a range of industrial processes, such as fabrication of microelectronic devices and high-throughput etching of resist on semiconductor substrates.