Used TEL / TOKYO ELECTRON UNITY 2E 855 DD #9145476 for sale

TEL / TOKYO ELECTRON UNITY 2E 855 DD is a full-fledged dry etched equipment designed for high-precision etching of advanced devices and development of new processes. It has a broad range of efficient functions that enable precise and accurate etching of thin layers of metals, ceramics and other materials. The system integrates two powerful etching sources, DIST-X and DIISET, to deliver rapid and stable reactive ion etching. Additionally, its Multiple Plasma Source (MPS) feature helps provide improved uniformity and uniform power distribution across the substrate ensuring superior etching quality of delicate thin layers on a wide variety of substrates. TEL UNITY 2E 855DD utilizes a series of advanced technologies to deliver precise etching. The unit uses an advanced impedance machine to ensure reliable etching processes and prevent arcing. In addition, the tool features photoelectric control for optimal power levels. The advanced source power control technology provides stable highly-uniform power across the substrate. The asset also incorporates Multi-Step Processing and Multi-Channel Processing, which enable precision etching of structured layers over large substrates. TOKYO ELECTRON UNITY 2 E 855 DD also features a low-pressure load-lock chamber that permits load to be maintained even when exchanging substrates and allows for faster processing. The model includes a processing module that is equipped with an inductively coupled plasma (ICP) source with a range of power power supply outputs to ensure repeatable and reliable etching. The equipment also features an advanced turbo pump control system to efficiently maintain low-pressure etching chamber conditions. Furthermore, TEL UNITY 2 E 855 DD is designed to be user-friendly for efficient and effective etching. The user-friendly multi-language user interface allows operators to program and monitor etching processes quickly, easily and accurately. The unit also includes a wafer mapping machine with real-time feedback of etching recipes to monitor etching processes. The etching chamber can be easily accessed for periodic maintenance. Overall, UNITY 2E 855 DD is a reliable and high precision etching tool for a wide range of applications. It combines efficient and advanced technologies to deliver precisely etched components. The low-pressure load-lock chamber and the advanced source power control ensure repeatable and reliable etching processes. Additionally, the asset is user-friendly with an intuitive multi-language interface for easy and accurate programming and monitoring of etching recipes.