Used TEL / TOKYO ELECTRON UNITY 2E 855 DD #9285006 for sale

TEL / TOKYO ELECTRON UNITY 2E 855 DD is a state-of-the-art etcher/ asher designed to provide high-performance production-grade results. The equipment is used for substrate shaping and stacking, as well as ashing and etching functions. The etcher/ asher is a two rack system that includes a main etch/ash rack and a off-line sample ashing/etch rack. The etching/ashing rack features a high-resolution direct drive slit-valve technology, which ensures precise etching/ashing control and accuracy while maintaining an optimal processing environment. The unit also includes a high-powered multi-axes rotatory wafer spin module that allows for high-speed uniform and accurate substrate geometrical mapping. The machine is equipped with a high-performance gas panel tool that provides dual gas sources for both etching and ashing mechanisms. The asset features an intelligent gas selector and regenerative gas purification module that can be used to optimize the gas flow rate and maintain proper flow regulators. Additionally, high purity source gases are delivered through a centrally located gas delivery model and custom-built gas manifold that ensures higher consistency and performance results. The equipment is equipped with a standard-size 4" by 8" electro-static quartz tube, which provides a standard etch/ash platform. The system also features a custom-built matching chamber that synchronizes air supply for uniform and consistent processes as well as a vacuum-sealed chamber and wide spectrum susceptor coil for excellent temperature stability. The unit also accommodates a wide range of process gases from Ar, CO, O2 to advanced chemistries such as SF6, CH4, NF3, and N2O. In addition, high-precision process monitoring and control is achieved through a synchronized pressure machine and automated process control tool. Overall, TEL UNITY 2E 855DD is an advanced etcher/ asher asset that provides high performance and production-grade results. The model features superior re-circulated gas control, high-resolution slit-valve technology, and multi-axis rotatory wafer spin module. Furthermore, intelligent gas selector and regenerative gas purification systems are designed to maintain reactivity and consistent process stability. With its customized matching chamber and wide-spectrum susceptor coil, the equipment is capable of achieving exceptional temperature control and high-precision process monitor and control.