Used TEL / TOKYO ELECTRON UNITY 2E 855 SS #293657483 for sale

TEL / TOKYO ELECTRON UNITY 2E 855 SS is an advanced, ultra-stable etcher / asher designed to achieve precision results in industrial etching and ashing processes. The equipment combines advanced removable etch modules, with enhanced substrate temperature and uniformity control to ensure optimum performance. TEL UNITY 2E 855 SS has a wide variety of process capability, allowing it to accommodate your etching and ashing applications with maximum throughput. Featuring a high-quality quartz tube-cluster design, this etcher / asher offers superior temperature uniformity with minimal wafer heating for simultaneous etching and ashing applications. It also features a 2-bar, forced convection support system, enabling maximum unit efficiency and excellent temperature control. TOKYO ELECTRON UNITY 2E 855 SS has a newly developed network-focused control machine, which enables clients to monitor all processes from a remote computer. It also includes a precision pressure controller with adjustable valves, allowing operators to set an optimal pressure range for improved throughput. In addition, the tool has intuitive controls that allow operators to input parameters quickly and easily. It features an advanced graphical user interface (GUI) that simplifies the set-up process. UNITY 2E 855 SS is designed to help process engineers increase yields and reduce costs through higher throughput and quality results. It also improves safety, thanks to its cleanroom compatible design, large enclosed chamber, and smart access port. The asset also has an advanced filtration model, as well as integrated leak detection and BEF compensation. TEL / TOKYO ELECTRON UNITY 2E 855 SS provides superb quality of etching, ashing, and deposition processes in the semiconductor industry and other industrial applications. Its combination of advanced etching modules, temperature uniformity control, and intuitive controls make it a cutting-edge tool for achieving the highest accuracy and precision in etching and ashing processes.