Used TEL / TOKYO ELECTRON Unity 855DD #9051321 for sale

TEL / TOKYO ELECTRON Unity 855DD
ID: 9051321
Wafer Size: 8"
Vintage: 1997
Oxide etcher, 8" (2) Chamber 1997 vintage.
TEL / TOKYO ELECTRON Unity 855DD is a high-specification plasma etcher/aher developed by TEL (TOKYO ELECTRON) Ltd. This etcher/asher has the ability to offer high-precision plasma etching of circuit boards, SiGe substrates, wafers, and nanomaterials. It is also capable of plasma ashing those same materials with exceptional precision. The 855DD utilizes a high speed pulse power supply design so that it can operate with a high workload capability and minimize wear on electrodes. It features independent dual-zone plasma control that allows for both etching and ashing of processed substrates. The dual-zone control enables higher etching uniformity and process repeatability. The 855DD is also equipped with long-life material-mixing tubes, whcih ensures an even cooling of substrates during etching and ashing process cycles. They provide users with superior flexibility in the etching and ashing they need to do. The 855DD features a 48-inch viewing chamber, which houses two separate etching and ashing systems, and also has an integral water cooling system for the electrodes. The equipment can automatically detect the temperature of the electrodes during operation to limit thermal stress which can result in lower defect rates and higher yields. The 855DD can process both top and bottom surfaces of substrates simultaneously. This improves throughput and makes the etching and ashing process more consistent and efficient. The 855DD utilizes top quality advanced process control technology to enable users to monitor the etching and ashing process accurately. It also provides users with a wealth of process optimization settings, allowing them to fine-tune the etching and ashing processes to achieve the best results for whatever task is being performed. Overall, the 855DD is an advanced etcher/asher designed to provide users with superior etching and ashing capabilities. It features high-precision plasma control, high process throughput, and advanced process control features to provide users with an easy-to-use etching and ashing solution with a very high degree of precision.
There are no reviews yet