Used TEL / TOKYO ELECTRON Unity IIe 655PD #9016203 for sale

TEL / TOKYO ELECTRON Unity IIe 655PD
ID: 9016203
Wafer Size: 6"
Vintage: 2006
Oxide etcher, 6" (2) Chambers 2006 vintage.
TEL / TOKYO ELECTRON Unity IIe 655PD is an etcher/asher designed for ultra-fine processing in the electronics industry. It is capable of performing advanced etching and ashing functions with superior precision and speed. TEL Unity IIe 655PD is ideal for the advanced lithography required for today's nanotechnology applications. TOKYO ELECTRON Unity IIe 655PD has an innovative multi-zone design which provides independent control of each process chamber. This allows for advanced processing for ultra-fine features with high throughput. The multi-zone design also improves process flexibility and maximizes production efficiency. The scanning electron microscope (SEM) allows for direct observation of the etching and ashing processes. This is especially useful when etching complex patterns or fine-pitch features such as those found in ultra-large scale integration (ULSI) circuits. The SEM enhances process control by providing real-time images of the process. Unity IIe 655PD uses a proprietary plasma source which provides uniform energy distribution and excellent etching uniformity. This combination of etching uniformity and process flexibility makes TEL / TOKYO ELECTRON Unity IIe 655PD ideal for advanced lithography applications. TEL Unity IIe 655PD also offers a simple and user-friendly interface for intuitive operation. It supports a large network of compatible computers, allowing users to make fine-tuned adjustments while the process is running. This ensures that the best possible results are achieved. TOKYO ELECTRON Unity IIe 655PD is designed with special safety measures to minimize operational hazards. It is certified to meet industry safety standards, such as CE certification for Europe and UL certification for the United States. This ensures user safety and provides extra peace of mind. Overall, Unity IIe 655PD provides superior etching and ashing performance while also offering advanced process control and optimized safety. It is the ideal platform for advanced lithography applications.
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