Used TEL / TOKYO ELECTRON Unity IIe 855DD #9109094 for sale

TEL / TOKYO ELECTRON Unity IIe 855DD
ID: 9109094
Wafer Size: 8"
Vintage: 1997
Oxide etchers, 8" (2) Chambers 1997 vintage.
TEL TEL / TOKYO ELECTRON Unity IIe 855DD is a high-performance automated etcher / asher equipment designed to provide a precision etching and ashing process in semiconductor applications. This system offers a wide range of choices in etching and ashing recipes for a variety of semiconductor wafers, such as Si, GaAs, GaP, AL, InP and CdZnSe. TEL UNITY IIE 855 DD uses classical ICP (inductively coupled plasma) technology compared to RIE (reactive ion etching) for reduced plasma contamination and improved selectivity. This unit features a maximum etch rate of up to 1 micron per second, providing fast, high-throughput etching and ashing. TOKYO ELECTRON UNITY II E-855DD also offers advanced features such as multi-step etching, recipe running, recipe recycling and traceable records. This machine is equipped with a state-of-the-art vacuum deposition chamber, providing excellent process uniformity, integrated vacuum pump and advanced gas handling tool for repeatable process and repeatable results. TEL / TOKYO ELECTRON UNITY IIE 855 DD also features an advanced recipe editing software package for user-friendly recipe management. TEL UNITY II E-855DD is equipped with a 15 inch LCD color monitor, two touch screens, a keyboard, a mouse and a wide selection of software programs. The equipment includes a plasmator, plasmator valve box asset, remote plasma source, cotrap power supply, plasma monitor, quartz susceptor bases and other auxiliary equipment. Additionally, the model is configured with proprietary advanced film deposition modules, such as its Auto Film Deposition Equipment, which uses power lines for higher film quality and Automatic Film Control System (AFCS). This unit is also designed with full safety protocols, including interlocks, gas pressure sensors, harsh vacuum interlocks, liquid trap exclusion, and plasmator perma-position detectors. It also offers an optional auto wafer transfer machine and improved E-chamber cleaning for improved etching and ashing performance. In conclusion, UNITY IIE 855 DD is an automated etcher / asher tool specifically designed to meet the needs of the semiconductor industry. It offers an array of features for reduced plasma contamination, improved selectivity, high-throughput etching and ashing, advanced film deposition modules, and full safety protocols.
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