Used TEL / TOKYO ELECTRON Unity IIe 855II #9236727 for sale
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TEL / TOKYO ELECTRON Unity IIe 855II is an etcher/asher equipment designed for semiconductor applications. It offers a full range of advanced etch/ash capabilities in a small footprint machine. TEL UNITYIIE-855 II has a chamber size of 676 x 762 x 457 mm (W x D x H) which will allow for processing of large numbers of workpieces in a given batch. It supports multiple wafer sizes, from 4" to 12" with an NAD capacity of up to 62 wafers. It utilizes a parallel-shutter etch/ash method, which allows it to process uniform thin layers with precise aspects ratios. The system also features frontside triple-patterning capability, which enables faster processes in comparison to a traditional etch/ash. The Unity IIe incorporates a multi-chamber sequential process architecture, so processes occur separately in different chambers before recombining into a single chamber. Up to nine different processes can be combined on one substrate in a single run, and the total cycle times are tailored accordingly. With its modular design, tooling accessories such as a pitch rotator can also be quickly integrated into the unit. The Unity IIe has an in-situ gas purification machine to reduce gas fusion and maintenance cycles. The equipment is fully compatible with TEL Digital Controller for automated parameter execution and tool monitoring. The Unity IIe is designed with smart robotics to ensure precision throughout asset operation, with its five-axis robot beam capable of multi-frequency operation for fast wafer transfer across chambers. It also has a Vision Alignment Model (VAS) to ensure critical alignment accuracy and create automated OCR and OMS marking. The base-pressure level of the equipment is an impressive 5 x 10-5 torr and can be boosted up to 10X using the substrate clamp vacuum technology. It is also equipped with a high-capacity I/O interface, providing an efficient data flow to and from a host computer system. TOKYO ELECTRON UNITY IIE 855 II is a highly advanced etcher/asher unit that offers a wide range of capabilities in a small footprint. It is ideal for semiconductor applications requiring high accuracy during etch/ash and can accommodate up to 62 wafers in a single run. It features advanced robotics and ensuring critical alignment accuracy along with an in-situ gas purification machine to reduce gas fusion and maintenance cycles. The tool is highly compatible with TOKYO ELECTRON Digital Controller and is ideal for a range of applications, such as thin-film coating, dielectric etch, and substrate patterning.
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