Used TEL / TOKYO ELECTRON Unity IIe 855SS #9177764 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9177764
Oxide etcher SCCM RF generator (power supply): Top: Daihen AGA27AIA Low pass filter: Daihen HFA-27B Bottom: Daihen WGA-30A Matcher: Top matching box: DAIHEN AMN-30C9 2MHz cut filter: DAIHEN WFL-01A BTM Matching box: DAIHEN WMN-30E Matcher controller: DAIHEN CB-13A Capacitance manometer: Process monitor: MKS 627B-15405 Process monitor: MKS 33.3 Pa Pressure control valve: VAT 65046-PH52-AEP1 P/C Unit box: Multi DC Power supply: SANKEN MLT-DCBOX5 HV-DC Supply: KYOSAN DC HV-PS AC Servo driver: YASKAWA SED-01 AP Gas box MFC: Gas1: C5F8/50 sccm AERA FC-795CT-BF-TC Gas2: C4F6/50 sccm AERA FC-795CT-BF-TC Gas3: CH2F2/50 sccm AERA FC-795CT-BF-TC Gas4: O2/2020 sccm AERA FC-795CT-BF-TC Gas5: O2/500 sccm AERA FC-795CT-BF-TC Gas6: Ar/1000 sccm AERA FC-795CT-BF-TC Gas7: CHF3/100 sccm AERA FC-795CT-BF-TC Gas8: CF4/100 sccm AERA FC-795CT-BF-TC Gas9: N2/500 sccm AERA FC-795CT-BF-TC Gas10: CO/1000 Sccm AERA FC-795CT-BF-TC Back pressure MFC: Edge: He/50 sccm AERA FC-780XC Center: He/50 sccm AERA FC-780XC Edge back pressure: Capacitance manometer: MKS 622A12TBE Capacitance manometer: MKS 13333.3 Pa Pressure control valve: STEC SV-P003 Center back pressure: Capacitance manometer: MKS 622A12TBE Capacitance manometer: MKS 13333.3 Pa Pressure control valve: STEC SY-P1203 BA Gauge ANELVA M430HG.
TEL / TOKYO ELECTRON Unity IIe 855SS is an etcher/asher that is designed to create high precision patterning on various types of materials. It has a high-vacuum etching/stripping capabilities with multi-wafer processing. This etcher/asher has a control software suite that automates the entire process of etching/ashing, with optimized precision. The design of the chamber also ensures high visibility of the wafer surfaces to the operator, while preventing any particle contamination. TEL UNITYIIE-855 SS can process up to 8 inch wafers, with a process chamber volume of 400 liters. It features a dual-frequency RF generator and has automated parameter adjustment. The chamber also utilizes a low-energy plasma source for maximum precision in patterning. The temperature of the vacuum chamber can be regulated from 5 to 250 degrees Celsius for a variety of materials, including silicon and organic substrates. It also supports multiple process gases including Ar, O2,CF4, and CHF3. TOKYO ELECTRON UNITY IIE-855SS is designed to achieve extremely high throughput speed, cutting the etching/ashing cycle time by half. It has a CCD camera for process monitoring, along with a gamma-ray sensor for precise measurement of particle removing efficiency. It also has an end-point detection system and auto-wafer transfer feature for easy automated operation. Users can monitor the condition of the etcher/asher remotely through Ethernet connectivity. This device also has a built-in cleanliness verification system which monitors the process environment to ensure no particle contamination. It also has both an online and offline recipe system to save and recall etching/ashing settings at any time. UNITY IIE-855SS is a powerful etcher/asher designed for precision patterning of various materials. It offers highly accurate results with extremely fast processing speeds, making it an ideal equipment for industrial and research applications.
There are no reviews yet