Used TEL / TOKYO ELECTRON Unity IIe 855SS #9177764 for sale
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ID: 9177764
Oxide etcher
SCCM
RF generator (power supply):
Top: Daihen AGA27AIA
Low pass filter: Daihen HFA-27B
Bottom: Daihen WGA-30A
Matcher:
Top matching box: DAIHEN AMN-30C9
2MHz cut filter: DAIHEN WFL-01A
BTM Matching box: DAIHEN WMN-30E
Matcher controller: DAIHEN CB-13A
Capacitance manometer:
Process monitor: MKS 627B-15405
Process monitor: MKS 33.3 Pa
Pressure control valve:
VAT 65046-PH52-AEP1
P/C Unit box:
Multi DC Power supply: SANKEN MLT-DCBOX5 HV-DC Supply: KYOSAN DC HV-PS AC Servo driver: YASKAWA SED-01 AP
Gas box MFC:
Gas1: C5F8/50 sccm AERA FC-795CT-BF-TC
Gas2: C4F6/50 sccm AERA FC-795CT-BF-TC
Gas3: CH2F2/50 sccm AERA FC-795CT-BF-TC
Gas4: O2/2020 sccm AERA FC-795CT-BF-TC
Gas5: O2/500 sccm AERA FC-795CT-BF-TC
Gas6: Ar/1000 sccm AERA FC-795CT-BF-TC
Gas7: CHF3/100 sccm AERA FC-795CT-BF-TC
Gas8: CF4/100 sccm AERA FC-795CT-BF-TC
Gas9: N2/500 sccm AERA FC-795CT-BF-TC
Gas10: CO/1000 Sccm AERA FC-795CT-BF-TC
Back pressure MFC:
Edge: He/50 sccm AERA FC-780XC
Center: He/50 sccm AERA FC-780XC
Edge back pressure:
Capacitance manometer: MKS 622A12TBE
Capacitance manometer: MKS 13333.3 Pa
Pressure control valve: STEC SV-P003
Center back pressure:
Capacitance manometer: MKS 622A12TBE
Capacitance manometer: MKS 13333.3 Pa
Pressure control valve: STEC SY-P1203
BA Gauge ANELVA M430HG.
TEL / TOKYO ELECTRON Unity IIe 855SS is an etcher/asher that is designed to create high precision patterning on various types of materials. It has a high-vacuum etching/stripping capabilities with multi-wafer processing. This etcher/asher has a control software suite that automates the entire process of etching/ashing, with optimized precision. The design of the chamber also ensures high visibility of the wafer surfaces to the operator, while preventing any particle contamination. TEL UNITYIIE-855 SS can process up to 8 inch wafers, with a process chamber volume of 400 liters. It features a dual-frequency RF generator and has automated parameter adjustment. The chamber also utilizes a low-energy plasma source for maximum precision in patterning. The temperature of the vacuum chamber can be regulated from 5 to 250 degrees Celsius for a variety of materials, including silicon and organic substrates. It also supports multiple process gases including Ar, O2,CF4, and CHF3. TOKYO ELECTRON UNITY IIE-855SS is designed to achieve extremely high throughput speed, cutting the etching/ashing cycle time by half. It has a CCD camera for process monitoring, along with a gamma-ray sensor for precise measurement of particle removing efficiency. It also has an end-point detection system and auto-wafer transfer feature for easy automated operation. Users can monitor the condition of the etcher/asher remotely through Ethernet connectivity. This device also has a built-in cleanliness verification system which monitors the process environment to ensure no particle contamination. It also has both an online and offline recipe system to save and recall etching/ashing settings at any time. UNITY IIE-855SS is a powerful etcher/asher designed for precision patterning of various materials. It offers highly accurate results with extremely fast processing speeds, making it an ideal equipment for industrial and research applications.
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